Abstract
The chemistry of preparing silicon nitride and the techniques to fabricate thin layers of silicon nitride in general are covered in detail in “Silicon” Suppl. Vol. B 5a. Preparation techniques relevant to general applications of silicon nitride in microelectronics are treated briefly in Chapter 2.1, p. 5; those relevant to specific devices are included in the respective chapters of this volume.
Keywords
- Silicon Nitride
- Silicon Oxide Layer
- Chemical Vapor Deposition Process
- Silicon Oxide Film
- Plasma Chemlcal Vapor Deposition
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Krimmel, E.F., Hezel, R., Nohl, U., Bohrer, R. (1991). Preparation and Patterning of Silicon Nitride Layers and Films. In: Pebler, A., Schröder, F. (eds) Si Silicon. Si. Silicium. Silicon (System-Nr. 15), vol S-i / B / 1-5 / 5 / c. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09901-8_2
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