Skip to main content

Ver- und Entsorgung von Reinstmedien

  • Chapter
Reinraumtechnik

Part of the book series: VDI-Buch ((VDI-BUCH))

  • 478 Accesses

Zusammenfassung

Die Reinstmedientechnik als Teilgebiet der Reinraumtechnik beschäftigt sich mit der Ver- und Entsorgung von Prozessgeräten mit Prozessmedien hoher und hñchster Reinheit, einschl. des Recyclings und anderweitiger Wiedernutzbarmachung von Ressourcen (Abb. 9.1).

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 54.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

Literatur

  1. SEMI S2: Safety guidelines for semiconductor manufacturing equipment, SEMI, Mountain View

    Google Scholar 

  2. SEMI S8: Safety guidelines for ergonomics human factors engineering of semiconductor, manufacturing equipment, SEMI, Mountain View

    Google Scholar 

  3. Qualität, Erzeugung und Verteilung von Reinstwasser, VDI 2083, Blatt 9 (in Bearbeitung), VDI Verlag, Berlin

    Google Scholar 

  4. Kawakami, M.; Ohwada, M.; Yagi, Y.; Ohmi, T.: Suppression of Native Oxide, from Ohmi, Tadahiro (ed): Ultraclean Technology Handbook, Volume 1, Marcel Dekker, Inc., New York, 1993

    Google Scholar 

  5. Harfst, W.F.: Dissolved Gases Pose Challenges to High-Purity Water Systems, Ultra-pure Water Journal. 10/1993/November

    Google Scholar 

  6. Reinstmedienversorgungsssysteme, VDI 2083, Blatt 10 (in Bearbeitung): VDI Verlag, Berlin

    Google Scholar 

  7. Stanitis, G.; Husted, G.R.: Surface properties of ECTFE, Ultrapure Water Journal, December 1996

    Google Scholar 

  8. Evans, R.W.; Coleman, D.C.: Pharmaceuticals: Corrosion Products found in Sanitary Water Systems — Part 1 and 2, Ultrapure Water Journal, 1999, October, December

    Google Scholar 

  9. Henley, M.: PVDF Remains Favorite for Piping in Semiconductor Plants, Ultrapure Water Journal, Volume 14, 1997

    Google Scholar 

  10. Rianda, K.: Design and Component Selection Considerations for Hot High Purity Water Delivery Systems, Ultrapure Water Journal, Volume 12, 1995

    Google Scholar 

  11. SEMI F61: Guide for ultrapure water systems used in semiconductor processes, Mountain View

    Google Scholar 

  12. ASTM D5127–99: Standard Guide for Ultra Pure Water in the Electronics and Semiconductor Industry, 1999

    Google Scholar 

  13. WABAG (Herausgeber): Handbuch Wasser, Vulkan-Verlag Essen, 1996

    Google Scholar 

  14. Ohmi, Tadahiro (ed): Ultraclean Technology Handbook, Volume 1, Marcel Dekker, Inc., New York, 1993

    Google Scholar 

  15. Meltzer, T. H.: High-Purity Water Preparation for the Semiconductor, Pharmaceutical, and Power Industries, Tall Oaks Publishing Inc., Littleton, 1993

    Google Scholar 

  16. Byrne, W: Reverse Osmosis — A Practical Guide for Industrial Users, Tall Oaks Publishing, Littleton, 1995

    Google Scholar 

  17. Owens, D.L.: Ion Exchange, Practical Principles of Ion Exchange Water Treatment, Tall Oaks Publishing Inc., Littleton, 1995

    Google Scholar 

  18. Malhotra, S.; Chan, O.; Chu, T.; Fuckso, A: Correlation of Boron Breakthrough Versus Resistivity and Dissolved Silica in RO/DI System, Ultrapure Water Journal, Volume 13, 1996

    Google Scholar 

  19. US-Patent 4, 574, 049

    Google Scholar 

  20. McBride, D.; Mukhopadhyay, D.: Higher Water Recovery and Solute Rejection through a New RO Process, Ultrapure Water Journal, Volume 14, 1997

    Google Scholar 

  21. SEMI E49.3: Guide for ultrahigh purity deionized water and chemical distribution systems in semiconductor manufacturing equipment, SEMI, Mountain View

    Google Scholar 

  22. SEMI E49.2: Guide for high purity deionized water and chemical distribution systems in semiconductor manufacturing equipment, SEMI, Mountain View

    Google Scholar 

  23. NFPA 318, Protection of Cleanroom, NFPA, Quincy

    Google Scholar 

  24. SEMI F41: Guide for qualification of a bulk chemical distribution system used in semiconductor processing, SEMI, Mountain View

    Google Scholar 

  25. International Technology Roadmap for Semiconductors, 2002 Edition, International Sematech, Austin, 2002

    Google Scholar 

  26. Weber, D.K.: Gas contamination in semiconductor processes, 3rd European SAES Pure gas workshop, Munich, 1992

    Google Scholar 

  27. International Technology Roadmap for Semiconductors (ITRS), Semiconductor Industry Association, International Sematech, Austin

    Google Scholar 

  28. SEMI E49.8: Guide for high purity gas distribution systems in semiconductor manufacturing equipment, SEMI, Mountain View, 1998

    Google Scholar 

  29. Nakajima, D.; Tamura, M.; Hishinuma, K.: Argon Gas Recovery and Purification Technology, Ultraclean Technology Journal / UCT Vol. 11 No. 3, 1999

    Google Scholar 

  30. Murakami, Y.: Industrial Gas Recovery and Recycling System in Semiconductor Industry, Ultraclean Technology Journal / UCT Vol. 11 No. 5, 1999

    Google Scholar 

  31. SEMI F14: Guide for the design of gas source control equipment enclosures, SEMI, Mountain View

    Google Scholar 

  32. SEMI S5: Safety guidelines for flow limiting devices, SEMI, Mountain View

    Google Scholar 

  33. SEMI F13: Guide for gas source control equipment, SEMI, Mountain View

    Google Scholar 

  34. SEMI S4: Safety guidelines for the segregation/separation of gas cylinders contained in cabinets, SEMI, Mountain View

    Google Scholar 

  35. Toxic Gas Ordinance, Santa Clara

    Google Scholar 

  36. Saleem, M.; Phuong, E.; Krishnan, S.: Improved Contamination Control Through Use of Passivated Surfaces for Gas And Liquid Delivery for Semiconductor Processing, Symposium on Contamination-Free Manufacturing (CFM) for Semiconductor Processing, Semicon West, San Francisco, 1999

    Google Scholar 

  37. SEMI F6: Guide for secondary containment of hazardous gas piping systems SEMI, Mountain View

    Google Scholar 

  38. SEMI Fl: Specification for leak integrity of high-purity gas piping systems and com-ponentsSEMI, Mountain View

    Google Scholar 

  39. Duly, P.: Trinkwasserverordnung, Leitfaden zur Verordnung über Trinkwasser und über Wasser für Lebensmittelbetriebe, Wiss.Verl.-Ges., Stuttgart, 1992,

    Google Scholar 

  40. SEMI F5: Guide for gaseous effluent handling, SEMI, Mountain View

    Google Scholar 

  41. SEMI E49.6: Guide for subsystem assembly and testing procedures — stainless steel systems, SEMI, Mountain View

    Google Scholar 

  42. SEMI E49.7: Guide for subsystem assembly and testing procedures — polymer sys-tems, SEMI, Mountain View

    Google Scholar 

  43. SEMI F3: Guide for welding stainless steel tubing for semiconductor manufacturing applicationsSEMI, Mountain View

    Google Scholar 

  44. Europäisches Arzneibuch, Council of Europe, Strasbourg, 1997

    Google Scholar 

  45. The United States Pharmacopeia: USP 26; United States Pharmacopeia Convention, Rockville

    Google Scholar 

  46. Billet, R.: Verdampfung und ihre technischen Anwendungen, Verlag Chemie, Weinheim, 1981

    Google Scholar 

  47. ISPE: Baseline-Pharmaceutical Engineering Guide, Volume 4: Water and Steam guide, 1997

    Google Scholar 

  48. Marty, B.: Suitability of PVDF Piping in Pharmaceutical Ultrapure Water Application, PDA Journal of Pharmaceutical Science & Technology, July-August 1996, Vol. 50, No. 4

    Google Scholar 

  49. EG-Leitfaden einer Guten Herstellungspraxis für Arzneimittel, 111/2244/87, Rev. 3, 1989

    Google Scholar 

  50. FDA: Guide to inspections of high Purity water system, Rockville, 1999

    Google Scholar 

  51. ISPE: Baseline-Pharmaceutical Engineering Guide, Volume 3: Sterile Manufacturing Facilities, 1999

    Google Scholar 

  52. Mathiesen, T. et al.: Using exposure tests to examine rouging of stainless steel

    Google Scholar 

Weiterführende Literatur

  • SEMI E10: Standard for Definition and Measurement of Equipment Reliability, Availability and Maintainability (RAM), SEMI, Mountain View, 1996

    Google Scholar 

  • United States Patent, Patent Number 5, 065, 794, Nov. 19, 1991

    Google Scholar 

  • SEMI E49.5: Guide for ultrahigh purity solvent distribution systems in semiconductor manufacturing equipment, SEMI, Mountain View, 1998

    Google Scholar 

  • SEMI E49.4: Guide for high purity solvent distribution systems in semiconductor manufacturing equipment, SEMI, Mountain View, 1998

    Google Scholar 

  • The European Agency for the Evaluation of Medicinal Products: Note for guidance on quality of water for pharmaceutical use, London, May 2002

    Google Scholar 

  • Vogeler, K.: Qualitätsanforderungen an Orbitalschweißnähte in der Halbleiter industrie und in Bio-/Pharmatechnischen Anlagen, Dockweiler AG, Neustadt-Glewe

    Google Scholar 

  • Konopka, A.: Current issues and system design considerations affecting pharmaceutical water systems, Ultrapure Water Journal, March 2002

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2004 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Gail, L., Hortig, HP. (2004). Ver- und Entsorgung von Reinstmedien. In: Gail, L., Hortig, HP. (eds) Reinraumtechnik. VDI-Buch. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09732-8_9

Download citation

  • DOI: https://doi.org/10.1007/978-3-662-09732-8_9

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-09733-5

  • Online ISBN: 978-3-662-09732-8

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics