Zusammenfassung
Die Strukturübertragung hat die Aufgabe, die lithographisch erzeugten Maskenmuster in dielektrische und leitfähige Schichten oder in das Halbleitersubstrat zu übertragen. Dies geschieht fast ausschließlich mit naßchemischen oder trockenen, plasmaunterstützten Ätzverfahren. Andere Methoden, wie die ”lift-off„Technik, sind auf wenige Anwendungen begrenzt geblieben. Die meisten Atzverfahren lassen sich auch auf die ganzflächige Entfernung einer Schicht anwenden.
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Frick, J., Zimmermann, F. (1991). Strukturübertragung. In: Prozeßtechnologie. Mikroelektronik. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09540-9_5
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