Skip to main content

Strukturerzeugung

  • Chapter
Book cover Prozeßtechnologie

Part of the book series: Mikroelektronik ((MIKROELEKTRONIK))

  • 254 Accesses

Zusammenfassung

Um eine mikroelektronische Schaltung zu fertigen, müssen verschiedene geometrische Strukturen nacheinander auf der Scheibenoberfläche erzeugt werden. Zum Beispiel müssen elektrisch aktive Gebiete von inaktiven Gebieten getrennt werden, die Steuerelektrode eines Transistors muß richtig plaziert sein und genau die richtige Breite haben, und am Ende des Fertigungsprozesses müssen alle Schaltungselemente durch Leiterbahnen miteinander verbunden werden. Die Größen dieser Strukturen liegen im Bereich einiger µm, wobei der Zwang zur fortschreitenden Verkleinerung der Schaltungselemente bereits zu Strukturen von nur noch 1 µm Breite oder sogar darunter geführt hat.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 49.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 84.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

Literatur

  1. Iscoff, R.: Photomask and Reticle Material Review. Semiconductor International (March 1986) 82–86

    Google Scholar 

  2. Yabumoto, S. et al.: Design-data Based Inspection of Photomasks and reticles. SPIE Vol. 633 Optical microlithography (1986) 138–144

    Google Scholar 

  3. Cowan, M. J.: Mask Limitations to VLSI Overlay Accuracy and Linewidth Variation. Solid State Technology (May 1982) 55–59

    Google Scholar 

  4. Bentz, E.; Feindt, H.: Eine neue, hochpr?zise Maskentechnik. ITG Fachberichte 98 Gro?integration (1987) 175–180

    Google Scholar 

  5. Titus, A. C.: Photomask Defects Causes and Solutions. Semiconductor International (October 1984) 94–100

    Google Scholar 

  6. Hearn, G.: Repair of Both Clear and Opaque Mask Defects. Microelectronics manufacturing and testing (October 1985) 19–20

    Google Scholar 

  7. Hershel, R.L: Pellicle Protection of IC Masks. Semiconductor International (August 1981)

    Google Scholar 

  8. ] Turnage, R.; Winn, R.: Attaching Pellicles to Photomasks in a Production

    Google Scholar 

  9. Environment; Microelectronic Manufacturing and Testing (June 1983)

    Google Scholar 

  10. Wolf, S; Tauber, R.N.: Silicon Processing For The VLSI Era Volume 1: Process Technology. Sunset Beach, California, USA: Lattice Press 1987

    Google Scholar 

  11. Dill, F.H. et al.: Optical Lithography. IEEE Transactions On Electron Devices ED-22 (1975) 440–464

    Google Scholar 

  12. Wake, R.W.; Flanigan, M.C.: A Review of Contrast in Positive Photoresists. SPIE 539 (1985) 291–298

    Article  Google Scholar 

  13. Tai, K.L. et al.: Submicron Optical Lithography using an Inorganic Resist/Polymer Bilevel Scheme. J. Vac. Sci. Technol. 17 (1980) 1169–1176

    Article  Google Scholar 

  14. Cuthbert, J.D.: Optical Projection Printing. Solid State Technology (August 1977) 59–69

    Google Scholar 

  15. Arden, W.; Keller, H.; Mader, L.: Optical Projection Lithography in the Sub-micron Range. Solid State Technology (July 1983) 143–150

    Google Scholar 

  16. Arden, W.; Mader, L.: Linewidth Control in Optical Projection Printing: Influence of Resist Parameters. SPIE 539 (1985) 219–226

    Article  Google Scholar 

  17. Walker, E.J.: Reduction of Photoresist Standing-Wave Effects by PostExposure Bake. IEEE Transactions On Electron Devices ED-22 (1975) 464–466

    Google Scholar 

  18. Born, M.; Wolf, E.: Principles of Optics, sixth edition. Oxford: Pergamon Press 1986

    Google Scholar 

  19. Goodman, J.W.: Introduction to Fourier Optics. New York: McGraw-Hill 1968

    Google Scholar 

  20. Bowden, M.J.: The Physics and Chemistry of the Lithographic Process. J. Electrochem. Soc. 128 (1981) 195C - 214C

    Article  Google Scholar 

  21. King, M.C.: Principles of Optical Lithography. Einspruch, N.G. (Hrsg.): VLSI Electronics Microstructure Science Volume 1. New York: Academic Press 1981 41–81

    Google Scholar 

  22. Stephanakis, A.C.; Rubin, D.I.: Advances in 1:1 Optical Lithography. SPIE 772 (1987) 74–85

    Article  Google Scholar 

  23. van den Brink, M.A. et al.: Performance of a Wafer Stepper with Automatic Intra-die Registration Correction. SPIE 772 (1987) 100–117

    Article  Google Scholar 

  24. Guild, J.: Diffraction Gratings as Measuring Scales. London: Oxford University Press 1960

    Google Scholar 

  25. Bouwhuis, G.; Wittekoek, S.: Automatic Alignment System for Optical Projection Printing. IEEE Transactions On Electron Devices ED-26 (1979) 723–728

    Google Scholar 

  26. Brown, A.V.; Arnold, W.H.: Optimization of Resist Optical Density for High Resolution Lithography on Reflective Surfaces. SPIE Vol. 539 Advances in Resist Technology and Processing II (1985) 259–266

    Google Scholar 

  27. Griffing, B.F.; West, P.R.: Contrast Enhancement Lithography. Solid State Technology (May 1985) 152–157

    Google Scholar 

  28. Mc Donnell Bushnell, L.P. et al.: Multilayer Resist Lithography Performance and Manufacturability. Solid State Technology (1986) 133–137

    Google Scholar 

  29. Lin, B.Y.: Multilayer Resist Systems and Processing. Solid State Technology (May 1983) 105–112

    Google Scholar 

  30. Coopmans, F.; Roland, B.: DESIRE: A New Route to Submicron Optical Lithography. Solid State Technology (June 1987) 93–99

    Google Scholar 

  31. Jain, K.: Advances in Excimer Laser Lithography. SPIE 774 (1987) 115–123

    Article  Google Scholar 

  32. Stengl, G. et al.: Current Status of Ion Projection Lithography. SPIE 537 (1985) 138–145

    Article  Google Scholar 

  33. Heuberger, A.: X-Ray Lithography. Solid State Technology (February 1986) 93–101

    Google Scholar 

Download references

Authors

Rights and permissions

Reprints and permissions

Copyright information

© 1991 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Fock, J.H., Fehling, H. (1991). Strukturerzeugung. In: Prozeßtechnologie. Mikroelektronik. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09540-9_4

Download citation

  • DOI: https://doi.org/10.1007/978-3-662-09540-9_4

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-17670-1

  • Online ISBN: 978-3-662-09540-9

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics