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High Resolution Microellipsometry

Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 67)

Abstract

Optical inspection and metrology are widely used in materials diagnostics and characterization. From the simple qualitative information obtained from imaging and phase contrast optics to the highly precise measurements provided by interferometry, polarimetry, and ellipsometry, optical techniques have been instrumental in advancing the state-of-the-art in materials science, microelectronics, biology, and many other disciplines [1]. The non-destructive nature of most optical measurements and their inherent simplicity have made them valuable to modern research and fabrication.

Keywords

Objective Lens Ratio Signal High Numerical Aperture Polarize Incident Light Radial Analyzer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 2004

Authors and Affiliations

  • Q. Zhan

There are no affiliations available

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