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Iron-Ion Implantation Studied by Conversion-Electron Mössbauer Spectroscopy

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Mössbauer Spectroscopy II

Part of the book series: Topics in Current Physics ((TCPHY,volume 25))

Abstract

Ion implantation has in recent years become a subject of considerable interest and great use in ma teri als science and technology . The technique allows the introduction of any atoms at well-controlled rates into almost any kind of solids, regardless of usual thermodynamic constraints . Therefore, the production of a variety of ma teri als with new and sometimes surpri sing properties is possible. As a tool of a well-controlled doping, ion beams are already successfully used in the manufacturing of semiconductor components. Ion implantation is also utilized for investigating a variety of phenomena in metals including nonequili brium alloying, radiation damage, surface modifications, erosion and wear, corrosion, etc.

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  1. R. D. Sawicka
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  2. J. A. Sawicki
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  1. Fachbereich Angewandte Physik, Universität des Saarlandes, D-6600, Saarbrücken, Fed. Rep. of Germany

    Ulrich Gonser

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Sawicka, R.D., Sawicki, J.A. (1981). Iron-Ion Implantation Studied by Conversion-Electron Mössbauer Spectroscopy. In: Gonser, U. (eds) Mössbauer Spectroscopy II. Topics in Current Physics, vol 25. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-08867-8_7

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  • DOI: https://doi.org/10.1007/978-3-662-08867-8_7

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