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Multi-Method High-Resolution Surface Analysis with Slow Electrons

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High-Resolution Imaging and Spectrometry of Materials

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 50))

Abstract

Electron microscopy with fast electrons has reached a high state of sophistication allowing not only structural imaging with atomic resolution but also chemical analysis in the sub-nanometre range and magnetic imaging with Lorentz microscopy and holography below ten nonometres. These possibilities are due to the strong elastic forward scattering, to the signal accumulation along the path of the electron and to the small aberrations of the employed electron optical elements. In surface imaging, the signal must come from a small depth and fast electrons are useful in only a few imaging modes that emphasize the surface features. Examples are weak-beam imaging, secondary electron emission microscopy and reflection electron microscopy, the last being the most versatile.

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Authors
  1. E. Bauer
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  2. T. Schmidt
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Editor information

Editors and Affiliations

  1. Department of Materials Science and Engineering, Case Western Reserve University, 414 White Building, 10900 Euclid Avenue, 44106-7204, Cleveland, OH, USA

    Frank Ernst

  2. MPI für Materialforschung, Heisenbergstrasse 3, 70569, Stuttgart, Germany

    Manfred Rühle

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© 2003 Springer-Verlag Berlin Heidelberg

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Bauer, E., Schmidt, T. (2003). Multi-Method High-Resolution Surface Analysis with Slow Electrons. In: Ernst, F., Rühle, M. (eds) High-Resolution Imaging and Spectrometry of Materials. Springer Series in Materials Science, vol 50. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-07766-5_8

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  • DOI: https://doi.org/10.1007/978-3-662-07766-5_8

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-07525-4

  • Online ISBN: 978-3-662-07766-5

  • eBook Packages: Springer Book Archive

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