Zusammenfassung
Die Technologie des GaAs-MESFET umfaßt eine Folge von komplexen Einzelprozessen, die reproduzierbar beherrscht werden miissen. Auf dieser Grundlage lassen sich schließlich Bauelemente herstellen, welche die aus den physikalischen Gegebenheiten des GaAs zu erwartenden guten Hochfrequenzei-genschaften aufweisen.
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Kellner, W., Kniepkamp, H. (1985). GaAs-Planartechnologie. In: GaAs-Feldeffekttransistoren. Halbleiter-Elektronik, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-07363-6_5
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DOI: https://doi.org/10.1007/978-3-662-07363-6_5
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