Agglomeration and Microstructural Effects

  • Doru C. Lupascu
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 61)


One of the major results of this work is presented in this section. It is a very simple finding with many implications. Upon the etching of a fatigued sample (2 E c , 108 cycles) with an HF/HC1 mixture (1.6 ml HF 49%, 2.6 ml HCl 37%, filled to 200 ml) the domain patterns (2–6 seconds), the grain boundaries (2–20 seconds) and some additional etch pits appear (60 seconds). The particular shape of the etch pits is shown in Figs. 3.1 and 3.2.


Domain Wall Unit Cell Volume Lead Oxide Microstructural Effect Domain Pattern 
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Copyright information

© Springer-Verlag Berlin Heidelberg 2004

Authors and Affiliations

  • Doru C. Lupascu
    • 1
  1. 1.Fachbereich Materialwissenschaften, Nichtmetallisch-Anorganische WerkstoffeTechnische Universität DarmstadtDarmstadtGermany

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