Abstract
In this final chapter, we outline a few of the fabrication sequences developed for fabricating nanoscale mechanical structures, using a range of substrates: Bulk, single crystal silicon; buried SiO2 heterostructures fabricated by SIMOX (Separation by IMplantation of OXygen) or by a wafer bonding technique; silicon single-crystal regrowth over patterned bulk silicon; and single-crystal GaAs heterostructures. We conclude with a brief discussion of critical point drying.
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© 2003 Springer-Verlag Berlin Heidelberg
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Cleland, A.N. (2003). Nanostructure Fabrication II. In: Foundations of Nanomechanics. Advanced Texts in Physics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-05287-7_11
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DOI: https://doi.org/10.1007/978-3-662-05287-7_11
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-07821-7
Online ISBN: 978-3-662-05287-7
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