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Laser-CVD of Microstructures

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Laser Processing and Chemistry

Part of the book series: Advanced Texts in Physics ((ADTP))

Abstract

The decomposition of precursor molecules in laser-induced chemical vapor deposition (LCVD) can be activated thermally (pyrolytic LCVD) or non-thermally (photolytic LCVD) or by a combination of both (photophysical LCVD). The type of process activation can be verified from the morphology of the deposit and from measurements of the deposition rate as a function of laser power, wavelength, substrate material, etc.; additional information is obtained from the analysis of data on the basis of theoretical models. The subsequent discussion concentrates on examples which were studied in most detail. Nevertheless, this discussion is very general, in the sense that most of the trends, features, and results apply to all of the corresponding systems listed in Appendix B.4. Applications of LCVD in microfabrication are summarized in Sect. 18.5.

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© 2000 Springer-Verlag Berlin Heidelberg

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Bäuerle, D. (2000). Laser-CVD of Microstructures. In: Laser Processing and Chemistry. Advanced Texts in Physics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-04074-4_16

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  • DOI: https://doi.org/10.1007/978-3-662-04074-4_16

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-08614-4

  • Online ISBN: 978-3-662-04074-4

  • eBook Packages: Springer Book Archive

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