Abstract

For the fabrication of fine LSI patterns, the wavelength of the wafer-stepper light source is reduced in photolithography, and the focus margin or depth-infocus becomes smaller. Therefore it is necessary to planarize the semiconductor device within the tight focus margin, say below 1 μm; hence the chemical mechanical polishing (CMP) technique has been of special interest for surface planarization.

Keywords

Hydrogen Peroxide Silicate Sedimentation Tungsten Agglomeration 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    W. Kern and D. A. Plutinen: Cleaning Solution Based on Hydrogen Peroxide for USE in Silicon Semiconductor Technology, RCA Review, 31 (7) (1970).Google Scholar
  2. [2]
    Y. Hayashi et al.:Jap. J. Appl. Phys. 34, 1037 (1995).Google Scholar
  3. [3]
    Y. Hayashi et al.:1996 Symp. VLSI Tech. Dig., p. 88 (1996)Google Scholar
  4. [4]
    Y. Hayashi et al.:Jap. J. Appl. Phys. 32, 1060 (1993).Google Scholar
  5. [5]
    Y. Hayashi et al.:Jap. J. Appl. Phys. 35, 1054 (1996).Google Scholar
  6. [6]
    E. J. W. Verway and J. Th. G. Overbeek: Theory of the Stability of Hydrophobic Colloids, Elsevier, Amsterdam (1948).Google Scholar
  7. [7]
    K.D. Beyer et al.:US Patent 4, 944, 836.Google Scholar
  8. [8]
    C. Yu et al.:IEEE 1991 VMIC Conf. Proc., p. 22 (1991).Google Scholar
  9. [9]
    S. Roehl et al.:IEEE 1992 VMIC Conf. Proc., p. 22 (1992).Google Scholar
  10. [10]
    Y. Hayashi et al.:IEEE 1992, IEDM Tech., Dig., p. 976 (1992).Google Scholar
  11. [11]
    K. Kikuta et al.:1993, IEDM Tech., Dig., p. 285 (1993).Google Scholar
  12. [12]
    T. Shinzawa et al.:1994 Symp VLSI Tech. Dig., p. 77, (1994).Google Scholar
  13. [13]
    H. Aoki et al.:1993 Symp. VLSI Tech. Dig., p. 107 (1993).Google Scholar
  14. [14]
    H. Aoki et al.:1994 Symp. VLSI Tech. Dig., p. 79 (1994).Google Scholar
  15. [15]
    H. Aoki et al.:1997 IEDM Techn. Dig., p. 777 (1997).Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1998

Authors and Affiliations

  • Yoshihiro Hayashi
    • 1
  1. 1.NECJapan

Personalised recommendations