Abstract
The fundamental interactions occurring between particles and the wafer surface in solutions are the van der Waals force (a molecular reciprocal action) and the electrostatic force (the reciprocal action of an electrical double layer). Research related to the particle adhesion mechanism on wafer surfaces in solutions that conform to the above two actions has thrived in recent years, and has done much to clarify the particle adhesion mechanism [1–12].
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References
M. Itano, F. W. Kern, Jr., I. Kawanabe, M. Miyashita, R. W. Rosenberg, and T. Ohmi: Particle deposition and removal in RCA cleaning process, in Proceedings of 8th Workshop on Ultraclean Technology, Tokyo, 35–55 (Dec. 1990).
M. Itano, F. W. Kern, Jr., I. Kawanabe, M. Miyashita, R. W. Rosenberg, and T. Ohmi: Particle deposition and removal in wet cleaning processes for semiconductor manufacturing, IEEE Transactions on Semiconductor Manufacturing 5, 114–120 (1992).
M. Itano, F. W. Kern, Jr., M. Miyashita, and T. Ohm: Particle removal from silicon wafer surface in wet cleaning process, IEEE Transactions on Semiconductor Manufacturing 6, 258–267 (1993).
D. J. Riley and R. G. Carbonel: The deposition of liquid based contaminants onto silicon surface, Proceedings, 36th Annual Technical Meeting of the Institute of Environmental Science, New Orleans, 224–228 (1990).
D. J. Riley and R. G. Carbonel: The deposition of contaminants from deionized water onto hydrophobic silicon wafers, Proceedings, 37th Annual Technical Meeting of the Institute of Environmental Science, San Diego, 885–891 (1991).
T. Niida: Controlling for particle adhesion in liquids: a basic way of thinking, Chemical Engineering Institute of Japan, Kasai Branch, Osaka, Japan, 14–25, Sept. 1989.
A. Saito, K. Ohta, and H. Oka: Particle deposition mechanism onto silicon wafer, Extended Abstracts of the 21st Conference on Solid State Devices and Materials, Tokyo, 409–412 (1989).
A. Saito et al Proceedings of 8th Workshop on Ultraclean Technology, Tokyo, 19–31, Dec. 1990.
M. Itano et al Proceedings of 27th Workshop on Ultraclean Technology, Tokyo, 31–40, June 1995.
T. Kezuka, M. Ishii, H. Hosomi, M. Suyama, M. Itano, and M. Kubo: The behavior of particles and their deposition control onto silicon wafer surfaces, Chemical Proceedings, Semiconductor Pure Water and Chemicals Conference, Santa Clara, CA, 144–158 (1993).
M. Itano, T. Kezuka, M. Ishii, T. Unemoto, M. Kubo, and T. Ohmi. Minimization of particle contamination during wet processing of silicon wafers, J. Electrochem. Soc. 142, 971–978 (1995).
M. Itano, T. Kezuka, M. Kubo, and T. Ohmi: Particle deposition and removal in wet cleaning process for semiconductor manufacturing, Proc. Semiconductor Pure Water and Chemicals Conference, Santa Clara, CA, 257–287 (1996).
A. Kitahara and K. Furusawa: Chemistry of Dispersion and Emulsion, 7th ed. Kougakutosho, Ltd, Tokyo, 1979.
J. E. E. M. yan den Meerakker and M. H. yan der Staaten: A mechanistic study of silicon etching in NH3/H202 cleaning solution, J. Electrochem. Soc. 137, 1239–1243 (1990).
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Itano, M., Kezuka, T. (1998). Particle Adhesion and Removal on Wafer Surfaces in RCA Cleaning. In: Hattori, T. (eds) Ultraclean Surface Processing of Silicon Wafers. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-03535-1_10
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DOI: https://doi.org/10.1007/978-3-662-03535-1_10
Publisher Name: Springer, Berlin, Heidelberg
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