Surface oxidation of metals and semiconductors in an oxidizing agent is a well-known phenomenon. Clean surfaces of many materials like Al, Nb, Si, etc., spontaneously react in air, even at room temperature, to form thin native oxide layers. With the materials under consideration the native oxide layer is very dense and terminates further oxidation. Native oxide layers are, typically, 10–100Å thick.
KeywordsMigration Furnace Ozone GaAs Nitrides
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