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Comparison of Processing Techniques, Applications of Laser Chemical Processing

  • Chapter
Chemical Processing with Lasers

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 1))

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Abstract

Throughout this book so far we have mentioned quite a number of applications of LCP. Local and extended-area deposition, oxidation, nitridation, reduction, metallization, doping, compound formation and etching are needed in many areas of technology such as mechanics, electronics, integrated optics and chemical technology. In virtually all of these fields LCP offers new and unique processing possibilities, which are impossible with currently available technologies. On the other hand, there are many applications where LCP has to compete with standard and well-established techniques such as conventional chemical vapor deposition (CVD) [9.1–4]; plasma processing, either deposition (PCVD) or etching (PE) [9.3,4]; electron beam (EB) processing [9.3–5]; ion beam processing, for example, reactive ion etching (RIE) [9.3,4]; photochemical processing with lamps [9.3,4], etc.

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References

  1. See, e.g., L.I. Maissel, R. Glang (eds.): Handbook of Thin Film Technology ( McGraw-Hill, New York 1970 )

    Google Scholar 

  2. For a review see, e.g., J. Bloem, L.J. Giling: in Current Topics in Materials Science, Vol. 1, ed. by E. Kaldis ( North-Holland, New York 1978 ) p. 147

    Google Scholar 

  3. I. Brodie, J. Muray: The Phyics of Microfabrication ( Plenum, New York 1982 )

    Google Scholar 

  4. N.G. Einspruch (ed.): VLSI Electronics, Microstructure Science, Vol. 7 ( Academic, New York 1983 )

    Google Scholar 

  5. A.G. Baker, W.C. Morris: Rev. Sci. Instrum. 32, 458 (1961)

    Article  ADS  Google Scholar 

  6. T.J. Chuang, I. Hussla, W. Sesselmann: in Laser Processing and Diagnostics, ed. by D. Bauerle, Springer Ser. Chem. Phys., Vol. 39 ( Springer, Berlin, Heidelberg 1984 ) p. 300

    Google Scholar 

  7. G.L. Loper, M.D. Tabat: Appl. Phys. Lett. 46, 654 (1985)

    Article  ADS  Google Scholar 

  8. G.L. Loper, M.D. Tabat: SPIE 459, 121 (1981T

    Google Scholar 

  9. G.L. Loper, M.D. Tabat: J. Appl. Phys. 58, 3649 (1985)

    Article  ADS  Google Scholar 

  10. D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: Appl. Phys. Lett. 38, 1018 (1981)

    Article  ADS  Google Scholar 

  11. T.F. Deutsch, J.C.C. Fan, G.W. Turner, R.L. Chapman, D.J. Ehrlich, R.M. Osgood: Appl. Phys. Lett. 38, 144 (1981)

    Article  ADS  Google Scholar 

  12. J.C. Muller, P. Siffert, C.T. Ho, J.I. Hanoka, F.V. Wald: J. Phys. (Paris) 43, C1–235 (1982)

    Google Scholar 

  13. E. Fogarassy, R. Stuck, J.J. Grob, P. Siffert: J. Appl. Phys. 52, 1076 (1981)

    Article  ADS  Google Scholar 

  14. R. Stuck, E. Fogarassy, J.C. Muller, M. Hodeau, A. Wattieux, P. Siffert: Appl. Phys. Lett. 38, 715 (1981)

    Article  ADS  Google Scholar 

  15. G.B. Turner, D. Tarrant, G. Pollock, P. Pressley, R. Press: Appl. Phys. Lett. 39, 967 (1981)

    Article  ADS  Google Scholar 

  16. T.F. Deutsch, J.C.C. Fan, D.J. Ehrlich, G.W. Turner, R.L. Chapman, R.P. Gale: Appl. Phys. Lett. 40, 722 (1982)

    Article  ADS  Google Scholar 

  17. T.F. Deutsch, D.J. Ehrlich, D.D. Rathman, D.J. Silversmith, R.M. Osgood: Appl. Phys. Lett. 39, 825 (1981)

    Article  ADS  Google Scholar 

  18. T.F. Deutsch: in Laser Diagnostics and Photochemical Processing for Semiconductor Devices, ed. by R.M. Osgood, S.R.J. Brueck, H.R. Schlossberg ( North-Holland, New York 1983 ) p. 225

    Google Scholar 

  19. C.H.J. v.d. Brekel, PhD Thesis, Eindhoven (1978)

    Google Scholar 

  20. S. Nishino, H. Honda, J. Matsunami: Jpn. J. Appl. Phys. 25, L87 (1986)

    Article  ADS  Google Scholar 

  21. C. Arnone, M. Rothschild, J.G. Black, D.J. Ehrlich: Appl Phys. Lett. 48, 1018 (1986)

    Article  ADS  Google Scholar 

  22. C.R. Moylan, T.N. Baum, C.R. Jones: Appl. Phys. A 40, 1 (1986)

    Article  ADS  Google Scholar 

  23. D.A. Doane: Solid State Technol. 23, 101 (1980)

    Article  Google Scholar 

  24. Karl Suss, Inc.: unpublished

    Google Scholar 

  25. K. Jain: in Proc. Int. Conf. Microcircuit Engineering, Cambridge, U.K. 1983, p. 181

    Google Scholar 

  26. K. Jain, C.G. Wilson, B.J. Lin: IEEE Electron Device Lett. 3, 53 (1982); IBM J. Res. Dev. 26, 151 (1982)

    Google Scholar 

  27. K. Jain, R.T. Kerth: Appl. Opt. 23, 648 (1984)

    Article  ADS  Google Scholar 

  28. D.J. Ehrlich, J.Y. Tsao, C.O. Bozler: J. Vac. Sci. Technol. B 3, 1 (1985)

    Article  Google Scholar 

  29. H. Craighead: private communication

    Google Scholar 

  30. S.M. Metev, S.K. Savtchenko, K.V. Stamenov, V.P. Veiko, G.A. Kotov, G.D. Shandibina: IEEE J. QE-17, 2004 (1981)

    Google Scholar 

  31. S.M. Metev, S.K. Savtchenko, K.V. Stamenov, V.P. Veiko, G.A. Kotov, G.D. Shandibina: in Laser Assisted Modification and Synthesis of Materials, Proc. Int. Winter School, Gyuletchitza, Bulgaria 1985, ed. by S. Metev, p. 61

    Google Scholar 

  32. S.M. Metev, S.K. Savtchenko, K.V. Stamenov, V.P. Veiko, G.A. Kotov, G.D. Shandibina: J. Phys. D 13, L 75 (1980)

    Google Scholar 

  33. R.F. Karlicek, V.M. Donnelly, G.J. Collins: J. Appl. Phys. 53, 1084 (1982)

    Article  ADS  Google Scholar 

  34. A. Kapenieks, M. Eyett, D. Bäuerle:

    Google Scholar 

  35. A. Kapenieks, R. Stumpe, M. Diagnostics II, ed. by D. Bauerle, Les Ulis 1986 )

    Google Scholar 

  36. D. Bauerle: in L9.6J, p. 166 D. Bäuerle: in Laser Processing and K.L. Kompa, L.D. Laude (Physique, R.M. Osgeod: in 1.9. 6J, p. 225 )

    Google Scholar 

  37. H.H. Gilgen, C.J. Chen, R. Krchnavek

    Google Scholar 

  38. D.J. Ehrlich, J.Y. Tsao: in J. Appl. Phys

    Google Scholar 

  39. D.J. Ehrlich, J.Y. Tsao: in

    Google Scholar 

  40. I.P. Herman: in 0.6j, p. 396

    Google Scholar 

  41. B.M. McWilliams, I.P. Herman, Appl. Phys. Lett. 43, 946 (1983)

    Article  ADS  Google Scholar 

  42. J.Y. Tsao, D.J. Ehrlich, D.J. Eyett, 9.6J, L9.4. 1, F. Silversmith, Appl. Phys. A (1986)

    Google Scholar 

  43. J.Y. Tsao, D.J. Ehrlich, D.J. Silversmith, R.W. Mountain: in Laser Controlled Chemical Processing of Surfaces, ed. by A.W. Johnson, D.J. Ehrlich, H.R. Schlossberg ( North-Holland, New York 1984 ) p. 55

    Google Scholar 

  44. T.F. Deutsch: in 1.9.6.1, p. 239

    Google Scholar 

  45. D.J. Ehrlich, R.M. Osgood, D.J. Silversmith, T.F. Deutsch: IEEE Electron Device Lett. 1, 101 (1980)

    Article  Google Scholar 

  46. W. Kräuter, D. Bäuerle: unpublished

    Google Scholar 

  47. H.H. Gilgen, D. Podlesnik, C.J. Chen, R.M. Osgood, Jr.: in 1.9. 43J, p. 139

    Google Scholar 

  48. D.V. Podlesnik, H.H. Gilgen, R.M. Osgood, A. Sanchez, V. Daneu: Appl Phys. Lett. 43, 1083 (1983)

    Article  ADS  Google Scholar 

  49. D.V. Podlesnik, H.H. Gilgen, R.M. Osgood, A. Sanchez, V. Daneu: in L9. 18J, p. 57

    Google Scholar 

  50. R.W. Haynes, G.M. Metze, V.G. Kreismanis, L.F. Eastman: Appl. Phys. Lett. 37, 344 (1980)

    Article  ADS  Google Scholar 

  51. A. Yariv, H. Nakamura: IEEE J. QE-13, 233 (1977)

    Google Scholar 

  52. J.Y. Tsao, R.A. Becker, D.J. Ehrlich, F.J. Leonberger: Appl. Phys. Lett. 42, 559 (1983)

    Article  ADS  Google Scholar 

  53. W. Kräuter, D. Bäuerle, F. Fimberger: Appl. Phys. A 31, 13 (1983) 9.54 F.A. Modine, D.H. Lowndes, J.R. Martinelli, E. Sonder: J. Appl. Phys. 57, 5066 (1985)

    Google Scholar 

  54. F.A. Modine, D.H. Lowndes, J.R. Martinelli, E. Sonder: J. Appl. Phys. 57, 5066 (1985)

    Google Scholar 

  55. S.P. Murarka: Silicides for VLSI Applications (Academic, Orlando 1983)

    Google Scholar 

  56. S. Metev, S. Savtchenko: in Interfaces under Laser Irradiation, ed. By D. Bauerle, L.D. Laude, M. Wautelet, Nato ASI Series ( M. Nijhoff, Dordrecht 1987 )

    Google Scholar 

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  1. Angewandte Physik, Johannes-Kepler-Universität Linz, A-4040, Linz, Austria

    Professor Dr. Dieter Bäuerle

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  1. Professor Dr. Dieter Bäuerle
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© 1986 Springer-Verlag Berlin Heidelberg

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Bäuerle, D. (1986). Comparison of Processing Techniques, Applications of Laser Chemical Processing. In: Chemical Processing with Lasers. Springer Series in Materials Science, vol 1. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-02505-5_9

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  • DOI: https://doi.org/10.1007/978-3-662-02505-5_9

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-02507-9

  • Online ISBN: 978-3-662-02505-5

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