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Heuristic Approach to Band-Edge Discontinuities in Heterostructures

  • H. Heinrich
  • J. M. Langer
Conference paper
Part of the Springer Series in Solid-State Sciences book series (SSSOL, volume 67)

Abstract

After a brief presentation of the various experimental techniques of band-offset determination in heterojunctions, we present our recent heuristic procedure for band-offset prediction. According to it, the valence-band-edge discontinuity in heterojunctions is given by the difference in the energy level positions of a transition metal deep impurity in the two com-pounds forming the heterojunction.

Keywords

Barrier Height Quantum Well Transition Metal Impurity Chemical Trend Internal Photoemission 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    R.S. Bauer and H.W. Sang Jr.: Surf. Sci. 132, 479 (1983)CrossRefGoogle Scholar
  2. 2.
    J.R. Waldrop, S. Kowalczyk, R.W. Grant, E.A Kraut and D.C. Miller: J. Vac. Sci. Technol. 19, 573 (1981)CrossRefGoogle Scholar
  3. 3.
    W.I. Wang, T.S. Kuan, E.E. Mendez and L. Esaki: Phys. Rev. B31, 6890 (1985)Google Scholar
  4. 4.
    R.W. Grant, J.R. Waldrop, S.P. Kowalczyk and E.A. Kraut: J. Vac. Sci. Technol. B3, 1295 (1985)Google Scholar
  5. 5.
    R.L. Anderson: Solid State Electron. 5, 341 (1962)CrossRefGoogle Scholar
  6. 6.
    J. Van Vechten: J. Vac. Sci. Technol. B3 1240 (1985)Google Scholar
  7. 7.
    A.D. Katnani and G. Margaritondo: Phys. Rev. B28, 1944 (1983)Google Scholar
  8. 8.
    J.M. Langer and H. Heinrich: Phys. Rev. Lett. 55, 1414 (1985)CrossRefGoogle Scholar
  9. 9..
    A. Zunger: proposed during 2nd Brazilian SchooT on Semiconductors, 1985 and in Solid State Physics (submitted for publication)Google Scholar
  10. 10.
    R.D. Dingle, A.C. Gossard and W. Wiegmann: Phys. Rev. Lett. 34, 1327 (1975)CrossRefGoogle Scholar
  11. 10a.
    see also R. Dingle in Festkörperproblerne, edited by H.J. Queisser, Vol. 15 (Vieweg, Braunschweig, 1975), p. 21CrossRefGoogle Scholar
  12. 11.
    H. Kroemer, W.-Y. Chen, J.S. Harris and D.D. Edwall: Appl. Phys. Lett. 36, 295 (1980)CrossRefGoogle Scholar
  13. 11a.
    H. Kroemer, ibid 46, 505 (1985)Google Scholar
  14. 11b.
    D.I. Babic and j “FT Kroemer: Solid State Electron. 28, 1015 (1985)CrossRefGoogle Scholar
  15. 12.
    M.I. Heiblum, M.I. Nathan and M. Eizenberg: Appl. Phys. Lett. 47, 503 (1985)CrossRefGoogle Scholar
  16. 13.
    a) W. Pb.tz and O.K. Ferry: Phys. Rev. B32, 3863 (1985)Google Scholar
  17. 13.
    b) W. Porod, W. Pötz and D.K. Ferry: J. Vac. Sci. Technol. B3, 1290 (1985)Google Scholar
  18. 14.
    R.C. Miller, A.C. Gossard and D.A. Kleinmann: Phys. Rev B32, 5443 (1985)Google Scholar
  19. 15.
    H. Kroemer: Surf. Sci. 132, 543 (1983)CrossRefGoogle Scholar
  20. 15.
    H. Kroemer: in Proceedings of the NATO Advanced Study Institute on Molecular Beam Epitaxy and Heterostructures, Erice, Sicily, 1983, edited by L.L. Chang and K. Ploog (Martinus Nijhoff, The Netherlands, 1984), p. 331, and J. Vac. Sci. Technol. B2, 433 (1984)Google Scholar
  21. 16.
    G. Duggan: J. Vac. Sci. Technol. B3, 1224 (1985)Google Scholar
  22. 17.
    H. Heinrich and J.M. Langer: Festkörperproblerne, edited by P. Grosse (Vieweg, Braunschweig, 1986) (to be published)Google Scholar
  23. 18.
    P. Vogl: in Festkörperproblerne, edited by P. Grosse (Vieweg, Braunschweig 1985), Vol. 25, p. 553Google Scholar
  24. 19.
    J.M. Langer and H. Heinrich: Physica 134B, 44 (1985) and Phys. Rev. (to be published)Google Scholar
  25. 20.
    F. Capasso: Surf. Sci. 132, 527 (1983)CrossRefGoogle Scholar
  26. 20.
    F. Capasso: ibid 142, 513 (1984)Google Scholar
  27. 21.
    D.V. Lang, R.A. Logan and L.C. Kimerling: in Physics of Semiconductors, j Proc. of the 13th Int. Conf., Rome 1976, edited by F.G. Fumi (Tipografia Marres, Rome 1974), p. 615Google Scholar
  28. 22.
    Z.G. Wang, L.A. Ledebo and H.G. Grimmeiss: J. Appl. Phys. 56, 2762 (1984)CrossRefGoogle Scholar
  29. 23.
    J. Batey and S.L. Wright: J. Appl. Phys. 59, 200 (1986)CrossRefGoogle Scholar
  30. 24.
    N. Chand, T. Henderxm, J. Klem, W.T. Masselink, R. Fisher, Y. Chang and H. Morkoc: Phys. Rev. B30, 4481 (1984)Google Scholar
  31. 24a.
    E.F. Schubert and K. Ploog, ibid B30, 7021 (1984)Google Scholar
  32. 24b.
    E.F. Schubert and K. Ploog, flppl. Phys. A33, 63 (1984)Google Scholar
  33. 25.
    W. A. Harrison: J. Vac. Sci. Technol.14, 1016 (1977)CrossRefGoogle Scholar
  34. 25a.
    ibid B3, 1231 (1985)Google Scholar
  35. 25b.
    E.A. Kraut, ibid B2, 486 (1984)Google Scholar
  36. 26.
    W.R. Frensley and H. Kroemer: Phys. Rev. B16, 2642 (1977)Google Scholar
  37. 27.
    W.E. Pickett, S.G. Louie and M.L. Cohen: Phys. Rev. B17, 815 (1978)Google Scholar
  38. 28.
    J. Sánchez-Dehesa and C. Tejedor: Phys. Rev. B26, 5824 (1982)Google Scholar
  39. 29.
    J. Tersoff: Phys. Rev. B30, 4874 (1984)Google Scholar
  40. 30.
    J. Van Vechten: Phys. Rev. 182, 891 (1969)CrossRefGoogle Scholar
  41. 30a.
    J. Van Vechten: ibid 187, 1007 (1969)Google Scholar
  42. 31.
    M.K. Kelly, D.W. Nites, E. CoTavita, G. Margaritondo and M. Henzler: Appl. Phys. Lett. 46, 768 (1985)CrossRefGoogle Scholar
  43. 32.
    W.I. Wanq and F. Stern: J. Vac. Sci. Technol. B3, 1280 (1985)Google Scholar
  44. 33.
    W.I. Wang: J. Vac. Sci. Technol. B1, 574 (1985)Google Scholar
  45. 34.
    J.S. Best: Appl. Phys. Lett 34, 522 (1979)CrossRefGoogle Scholar
  46. 35.
    S.R. Forrest, P.H. Schmidt, T.O. Wilson and M.L. Kaplan: Appl. Phys. Lett. 45, 1199 (1984)CrossRefGoogle Scholar
  47. 36.
    H. Temkin, M.B. Panish, P.M. Petroff, R.A. Hamm, J.M. Vandenberg and S. Sumski: Appl. Phys. Lett. 47, 394 (1985)CrossRefGoogle Scholar
  48. 37.
    P.E. Brunemeier, D.G. Deppe and N. Holonyak, Jr.: Appl. Phys. Lett. 46, 755 (1985)CrossRefGoogle Scholar
  49. 38.
    P.S. Whitney and C. Fonstad: J. Appl. Phys. 57, 4663 (1985)CrossRefGoogle Scholar
  50. 39.
    L. Eaves, A.W. Smith, M. Skolnick and B. Cockayne: J. Appl. Phys. 53, 4955 (1982)CrossRefGoogle Scholar
  51. 40.
    S.P. Kowalczyk, W.J. Schaffer, E.A. Kraut and R.W. Grant: J. Vac. Sci. Technol. 20, 705 (1982)CrossRefGoogle Scholar
  52. 41.
    J.S. Best and J.O. McCaldin: J. Vac. Sci. Technol. 16, 1130 (1979)CrossRefGoogle Scholar
  53. 42.
    T.F. Kuech and J.O. McCaldin: J. Appl. Phys. 53, 312T (1982)CrossRefGoogle Scholar
  54. 43.
    Y. Guldner, G. Bastard, J.P. Vieren, M. Voss, J.P. Faurie and A. Millon: Phys. Rev. Lett. 51, 907 (1983)CrossRefGoogle Scholar
  55. 43a.
    D.J. Olego, J.P. Faurie and P.M. Racah: ibid 55, 328 (1985)CrossRefGoogle Scholar
  56. 44.
    C.E. Jones, V. Nair, J. Lindquist and K.L. Polla: J. Vac. Sci. Technol. 21, 187 (1982)CrossRefGoogle Scholar
  57. 45..
    A. Mycielski, P. Dzwonkowski, B. Kowalski, B.A. Orlowski, M. Dobrowolska, M. Arciszewska, W. Dobrowolski and J.M. Baranowski: J. Phys. C (in press)Google Scholar
  58. 46.
    A. Franciosi, S. Chang, C. Caprile, R. Reifenberger and U. Debska: J. Vac. Sci. Technol. A3, 926 (1985)Google Scholar
  59. 46a.
    A. Franciosi, G. Chang, R. Reifenberger, U. Debska and R. Riedel: Phys. Rev. B32, 6682 (1985)Google Scholar
  60. 47.
    M.J. Caldas, A. Fazzio and A. Zunger: Appl. Phys. Lett.45, 671 (1984)CrossRefGoogle Scholar
  61. 48.
    L.A. Ledebo and B. Ridley: J. Phys. C 15, L961 (1982)CrossRefGoogle Scholar
  62. 49.
    S.M. Sze: Physics of Semiconductor Devices (Wiley, New Yor, k, 1982)Google Scholar
  63. 50.
    J. Tersoff: J. Vac. Sci. Technol. B3, 1157 (1985)Google Scholar
  64. 50a.
    J. Tersoff: Phys. Rev. Lett. 52, 465 (1984)CrossRefGoogle Scholar
  65. 51.
    W.E. Spicer, N. Newman, T. Kendelewicz, W.G. Petro, M.D. Williams, C.E. McCants and I. Lindau: J. Vac. Sci. Technol. B3, 1178 (1985)Google Scholar
  66. 51a.
    A. Zunger: Thin Solid Films 104, 301 (1983) T. Kendelewicz and I. Lindau (to be published)CrossRefGoogle Scholar
  67. 52.
    P. Vogl: in Festkörperproblerne, edited try J. Treusch (Vieweg, Braunschweig, 1981), Vol. 21, p. 191Google Scholar
  68. 53.
    O.F. Sankey, R.E. Allen, S.-F. Ren and J.D. Dow: J. Vac. Sci. Technol. 133, 1162 (1985)Google Scholar
  69. 53a.
    C.B. Duke and, C. Mailhiot, ibid, 133, (1985) p. 1170Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1986

Authors and Affiliations

  • H. Heinrich
    • 1
  • J. M. Langer
    • 2
  1. 1.Institut fur ExperimentalphysikJohannes Kepler Universität LinzLinzAustria
  2. 2.Institute of PhysicsPolish Academy of SciencesWarsawPoland

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