Abstract
Literature research in sec. 2.6 showed that some separate studies aimed on fabrication of specific structures were performed by different research groups. However, these studies only showed some effects, such as current crowding for insulating frontside masking (for example, Fig. 2.41), without considering complete time evolution of the etch shapes during the process at various conditions. Therefore, in this chapter, for the first time, detailed studies of shape control obtained through localization with basic localization techniques, namely, frontside masking and backside contacts, are presented.
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© 2018 Springer Fachmedien Wiesbaden GmbH
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Ivanov, A. (2018). Anodization process as a structuring technique. In: Silicon Anodization as a Structuring Technique. Springer Vieweg, Wiesbaden. https://doi.org/10.1007/978-3-658-19238-9_5
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DOI: https://doi.org/10.1007/978-3-658-19238-9_5
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Online ISBN: 978-3-658-19238-9
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