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Maskless Laser Micropatterning

  • Simeon M. Metev
  • Vadim P. Veiko
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 19)

Abstract

Laser patterning comprises a combination of laser-assisted methods for direct maskless structuring the surface of a solid [7.1–6]. This laser-assisted micro-technological lithographic technique has extensively been investigated, and some of the achievements have already found concrete industrial application [7.1–11].

Keywords

Laser Power Thin Metal Film Free Molecular Regime Irradiate Zone Etching Reaction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 7.1
    V.P. Veiko, B.N. Kotletzov, M.N. Libenson: Laser Lithography (in Russian) (Znanie, Leningrad 1971)Google Scholar
  2. 7.2
    S. Metev: Laser lithography and its application in microelectronics. Proc. 9th Int’l Conf. Quantum Electronics and Nonlinear Optics, Posnan, Poland (1980)Google Scholar
  3. 7.3
    S. Metev: Physico-chemical basis of laser lithography. Physical Processes in Laser-Materials Interactions, ed. by M. Bertolotti, (Plenum, New York 1983)Google Scholar
  4. 7.4
    S. Metev, V. Veiko: Thermochemical laser lithography. Laser-Assisted Modification and Synthesis of Materials, ed. by S. Metev (Sofia Univ. Press, Sofia 1985)Google Scholar
  5. 7.5
    S. Metev, S. Savtchenko: Thermochemical laser lithography on the basis of local oxidation of thin metal films. Interfaces Under Laser Irradiation, ed. by L.D. Laude, D. Bäuerle, M. Wautelet (Martinus Nijhoff, Boston 1987)Google Scholar
  6. 7.6
    D. Bäuerle: Chemical Processing with Lasers, Springer Ser. Mat. Sci., Vol. 1 (Springer, Berlin, Heidelberg 1986)Google Scholar
  7. 7.6
    D. Bäuerle: Laser Processing and Chemistry, 2nd edn. (Springer, Berlin, Heidelberg 1996)Google Scholar
  8. 7.7
    I.W. Boyd : Laser Processing of Thin Films and Microstructures, Springer Ser. Mat. Sci., Vol. 3 (Springer, Berlin, Heidelberg 1987)CrossRefGoogle Scholar
  9. 7.8
    K. G. Ibbs, R.M. Osgood (eds.): Laser Chemical Processing for Microelectronics (Cambridge Univ. Press, Cambridge 1989)Google Scholar
  10. 7.9
    B.J. Lin (ed.): Optical/Laser Microlithography. Proc. SPIE 922 (SPIE, Bellingham 1988)Google Scholar
  11. 7.9
    B.J. Lin (ed.): Optical/Laser Microlithography. Proc. SPIE 1088 (SPIE, Bellingham 1989)Google Scholar
  12. 7.10
    D.J. Ehrlich, J. Y. Tsao (eds.): Laser Microfabrication — Thin Film Processes and Lithography (Academic, New York 1989)Google Scholar
  13. 7.11
    K. Jain: Eximer Laser Lithography (SPIE-Opt. Eng. Press, Bellingham 1990)Google Scholar
  14. 7.12
    F.V. Bunkin, N. A. Kirichenko, B.S. Luk’yanchuk: Usp. Fiz. Nauk 138, 45 (1982) [Engl, trasl.: Sov. Phys.-Usp. 138, (1982)]CrossRefGoogle Scholar
  15. 7.13
    A. Kapenieks, M. Eyett, D. Bäuerle: Appl. Phys. A41, 331 (1986)Google Scholar
  16. 7.14
    V.P. Veiko, G.A. Kotov, M.N. Libenson, M.N. Nikitin: Dokl. Akad. Nauk. SSSR 208, 587 (1973) [Engl, transl.: Sov. Phys.-Dokl 18, 83 (1973)]Google Scholar
  17. 7.15
    S.M. Metev, S.K. Savchenko, K.V. Stamenov: J. Phys. D 13, L-75 (1980)Google Scholar
  18. 7.16
    R.B. Gerassimov, S.M. Metev, K.V. Savchenko: J. Phys. D 17, 1671 (1984)Google Scholar
  19. 7.17
    V.P. Veiko, G.A. Kotov, M.N. Libenson: Elektronnaya Tekhnika, Ser. 3 Mikroelektronika No. 4, 48 (1973)Google Scholar
  20. 7.18
    S.M. Metev, K.V. Savchenko, K.V. Stamenov, V.P. Veiko, G.A. Kotov, G.D. Shandibina: IEEE J. Quant. Electr. 17, 2004 (1981)CrossRefGoogle Scholar
  21. 7.19
    E.M. Gross, G.S. Fisanick: Appl. Phys. Lett. 47, 9 (1985)CrossRefGoogle Scholar
  22. 7.20
    V.P. Veiko, G.A. Kotov, V.A. Smirnov, G.D. Shandibina, E.B. Yakovlev: Kvant. Elektron. 7, 2196 (1981) [English transl.: Sov. J. Quant. Electr. 11, 1338 (1981)]Google Scholar
  23. 7.21
    J. Benard: Oxidation dex Metaux (Villars, Paris 1964)Google Scholar
  24. 7.22
    V. Koronkevich, A. Poleshchuk, E. Churin, Yu. Yorlov: Sov. Tech. Phys. Lett. 11, 57 (1985)Google Scholar
  25. 7.23
    L. Maissei, R. Glang (eds.): Handbook of Thin Film Technology (McGraw-Hill, New York 1970)Google Scholar
  26. 7.24
    V.P. Koronkevich, G.A. Lenkova, I.A. Mikhal’tzova: Avtometriya No. 1, 4 (1985)Google Scholar
  27. 7.25
    V. Koronkevich, A. Poleshchuk, E. Churin, Yu. Yurlov: Sov. J. Quant. Electr. 15, 497 (1985)Google Scholar
  28. 7.26
    P.A. Skiba: Zhur. Priklad. Spektroskop. 37, 242 (1982)Google Scholar
  29. 7.27
    A.G. Nepokojchitzkij, P.A. Skiba: Zhur. Priklad. Spektroskop. 31, 618 (1979)Google Scholar
  30. 7.28
    P.A. Skiba, A.G. Nepokojchitzkij: Zhur. Priklad. Spektroskop. 31, 219 (1979)Google Scholar
  31. 7.29
    R.B. Gerassimov, S.M. Metev, K.V. Savchenko, G.A. Kotov, V.P. Veiko: Appl. Phys. B28, 266 (1982)Google Scholar
  32. 7.30
    V.S. Bogoyawlenskij, E.F. Ivanov, A.A. Chel’nij: Elektronnaya Promishlenost No. 5, 96 (1972)Google Scholar
  33. 7.31
    V.P. Veiko, G.A. Kotov, M.N. Libenson, M.N. Nikitin: In Physico-Technical Basis of Laser Technology, Proc. School, Leningrad, USSR, 1979 (LDNTP, Leningrad 1979) p. 43Google Scholar
  34. 7.32
    V.P. Ageev, S. Allen, V.I. Konov: Laser Deposition of Metals from Metal Resinate Solid Films, Reprint No. 143 of the Inst. Gen. Phys. (AN SSSR, Moscow 1986)Google Scholar
  35. 7.33
    M.N. Libenson, V.P. Veiko: Electronnaya Tekhnika Ser. 6 No. 3, 25 (1974)Google Scholar
  36. 7.34
    G.J. Fisanick, M.F. Gross: J. Appl. Phys. 57, 1139 (1985)CrossRefGoogle Scholar
  37. 7.35
    J.L. Vossen, W. Kern (eds.): Thin Film Processes (Academic, New York 1978)Google Scholar
  38. 7.36
    E. Kaldis (ed.): Current Topics in Materials Science, Vol. 1 (North-Holland, New York 1971)Google Scholar
  39. 7.37
    B.M. McWilliams, H.W Chin, I.P. Herman, R.A. Hyde, F. Mitlitski, J.C., Whitehead, L.L. Wood: In Laser-Assisted Deposition, Etching and Doping, ed. by S.D. Allen (SPIE, Washington 1984) p. 49Google Scholar
  40. 7.38
    S.D. Allen, R.Y. Jan, R.H. Edwards, S.M. Mazuk, S.D. Vernon: In Laser-Assisted Deposition, Etching and Doping, ed. by S.D. Allen (SPIE, Washington 1984) p. 42Google Scholar
  41. 7.39
    S.D. Allen: J. Appl. Phys. 52, 6501 (1981)CrossRefGoogle Scholar
  42. 7.40
    S.D. Allen, A.B. Trigubo: J. Appl. Phys. 54, 1641 (1983)CrossRefGoogle Scholar
  43. 7.41
    Y. Rytz-Froidevaux, R.P. Salathe, H.H. Gilden: Phys. Lett. A 84, 216 (1981)CrossRefGoogle Scholar
  44. 7.42
    R.W. Bigelow, J.G. Black, C.B. Duke, W.R. Salaneck, H.R. Thomas: Thin Solid Films 94, 233 (1982)CrossRefGoogle Scholar
  45. 7.43
    C.P. Christensen, K.M. Lekin: Appl. Phys. Lett. 32, 254 (1978)CrossRefGoogle Scholar
  46. 7.44
    D. Bäuerle, P. Irsigler, G. Leydendecker, H. No. 11, D. Wagner: Appl. Phys. Lett. 40, 819 (1982)CrossRefGoogle Scholar
  47. 7.45
    G. Leyendecker, D. Bäuerle, P. Geittner, H. Lydtin: Appl. Phys. Lett. 39, 921 (1981)CrossRefGoogle Scholar
  48. 7.46
    S.D. Allen, A.B. Trigubo, M.L. Teisinger: J. Vac. Sci. Technol. 20, 469 (1982)CrossRefGoogle Scholar
  49. 7.47
    I.P. Herman, R.A. Hyde, B.M. McWilliams, A.H. Weisberg, L.L. Wood: In Laser Diagnostics and Photochemical Processing for Semiconductor Devices, ed. by R.M. Osgood, S.R.J. Brueck, H.R. Schlossberg (North-Holland, Amsterdam 983) p. 9Google Scholar
  50. 7.48
    D. Ehrlich, G. Higashi, M. Oprysko (eds.): Laser and Particle-Beam Chemical Processing for Microelectronics, Symp. Proc. 101 (MRS, Pittsburgh 1988)Google Scholar
  51. 7.49
    B.B. Damaskin, O.A. Petrij: Introduction in Electrochemical Kinetics (in Russian) (Visha Shkola, Moscow 1975)Google Scholar
  52. 7.50
    R.J. von Gutfeld, E.E. Tynar, R.L. Melcher, S.E. Blum: Appl. Phys. Lett. 35, 651 (1979)CrossRefGoogle Scholar
  53. 7.51
    E.K. Koslova, A.I. Portnyagin, A.I. Romanchenko, A.E. Filippov: Reprint Phys. Fac. MGU No. 14 (1983)Google Scholar
  54. 7.52
    F.V. Bunkin, B.S. Luk’yanchuk: Appl. Phys. A 37, 117 (1985)CrossRefGoogle Scholar
  55. 7.53
    H. Stafast: Angewandte Laser Chemie (Springer, Berlin, Heidelberg 1993)Google Scholar
  56. 7.54
    A.A. Eremenko, E.K. Koslova et al: Preprint Fiz. Fak. MGU No. 19 (1984)Google Scholar
  57. 7.55
    M.H. Gelchinski, R.J. von Gutfeld, L.T. Romankiw: In Interfaces Under Laser Irradiation, ed. by L.D. Laude, D. Bäuerle, M. Wautelet (Martinus Nijhoff, Boston 1987) p. 349Google Scholar
  58. 7.56
    A.A. Eremenko, E.K. Kozlova, A.I. Portnyagin: Kvant. Elektr. 11, 1677 (1984) [Engl, transl.: Sov. J. Quant. Electr. 14, 1042 (1984)]Google Scholar
  59. 7.57
    D. Bäuerle: Laser Processing and Chemistry (Springer, Berlin, Heidelberg 1996) p. 390Google Scholar
  60. 7.58
    J.W.M. Jacobs, C.J.C.M. Nillesen: J. Vac. Sci. Technol. B8, 635 (1990)Google Scholar
  61. 7.59
    R. Nowak, S. Metev, G. Sepold: Materials and Manufacturing Processes 9, 429 (1994)CrossRefGoogle Scholar
  62. 7.60
    S. Metev: In Excimer Lasers and New Trends in Laser Microtechnology, ed. by S. Metev, G. Sepold (Meisenbach, Bamberg 1994) p. 73Google Scholar
  63. 7.61
    R.J. von Gutfeld, E.E. Tyran, R.L. Melcher, S.E. Blum: Appl. Phys. Lett. 35, 651 (1979)CrossRefGoogle Scholar
  64. 7.62
    R.J. von Gutfeld, R.E. Acosta, L.T. Romankiw: IBM Journal of Research and Development, 26, 136 (1982)CrossRefGoogle Scholar
  65. 7.63
    J.Y. Tsao, D.J. Ehrlich: Appl. Phys. Lett. 42, 146 (1983)CrossRefGoogle Scholar
  66. 7.64
    T. Donohue: In Laser Processing and Diagnostics, ed. by D. Bäuerle, Springer Ser. Chem. Phys., 39 (Springer, Berlin, Heidelberg 1984)CrossRefGoogle Scholar
  67. 7.65
    R.J. von Gutfeld, D.R. Vigliotti, M. Datta: J. Appl. Phys. 64, 5197 (1988)CrossRefGoogle Scholar
  68. 7.66
    R. F. Miracky, K. Doss: In Laser and Particle-Beam Chemical Processing for Microelectronics, ed. by D. Ehrlich, G. Higashi, M. Oprysko, MRS — Symp. Proc., 101 (MRS, Pittsburgh 1988)Google Scholar
  69. 7.67
    R. Nowak, S. Metev, G. Sepold: In Excimer Lasers and New Trends in Laser Microtechnology, ed. by S. Metev, G. Sepold (Meisenbach, Bamberg 1994) p. 129Google Scholar
  70. 7.68
    R. Nowak, S. Metev, G. Sepold: In Laser Materials Processing: Industrial and Microelectronics Application, ed by E. Beyer, M. Cantello, A.V. La Rocca, L.D. Laude, F.O. Olsen, G. Sepold, SPIE 2207 (SPIE, Bellingham 1994) p. 633Google Scholar
  71. 7.69
    R. Nowak, S. Metev: Appl. Phys. A 63, 133 (1996)CrossRefGoogle Scholar
  72. 7.70
    R. Nowak, S. Metev, G. Sepold: Sensors and Actuators A51, 41 (1995)Google Scholar
  73. 7.71
    R. Nowak, S. Metev, K. Meteva, G. Sepold: In Advanced Laser Processing of Materials — Fundamentals and Applications, ed. by R. Singh, D. Norton, J. Narayan, J. Cheung, L.D. Laude, MRS — Symp. Proc., 397 (MRS, Pittsburgh 1996)Google Scholar
  74. 7.72
    R. Nowak, S. Metev: In Proc. ECLAT’96, ed. by F. Dausinger, H. W. Bergmann, J. Sigel (AWT -Dinges & Frick, Wiesbaden 1997), p. 725Google Scholar
  75. 7.73
    L. Hasenberg: In DECHEMA Corrosion Handbook, ed. by D. Behrens, Vol. 8 (VCH, Weinheim 1991)Google Scholar
  76. 7.74
    R. Nowak, K. Meteva, S. Metev: In Micro System Technologies, ed. by H. Reichl, A. Heuberger (VDE, Berlin 1996) p. 627Google Scholar
  77. 7.75
    Y.F. Lu, M. Takai, S. Nagamoto, T. Minamisono, S. Namba: Jpn. J. Appl. Phys. 28, 2151 (1989)CrossRefGoogle Scholar
  78. 7.76
    M. Takai: In Excimer Lasers and New Trends in Laser Microtechnology, ed. by S. Metev, G. Sepold (Meisenbach, Bamberg 1994) p. 95Google Scholar
  79. 7.77
    M.N. Veiko, G.A. Kotov, V.P. Libenson: In Laser Application in Science and Technics (in Russian), Proc. Conf., Leningrad, USSR, 1971, (LDNTP, Leningrad 1971) p. 17Google Scholar
  80. 7.78
    V.P. Veiko, G.A. Kotov, M.N. Libenson: Fiz. Khim. Obrab. Mater. No. 2, 16 (1973)Google Scholar
  81. 7.79
    L.D. Laude, D. Bäuerle, M. Wautelet (eds.): Interfaces Under Laser Irradiation (Martinus Nijhoff, Boston 1987)Google Scholar
  82. 7.80
    D. Bäuerle, K.L. Kompa, L. Laude (eds.): Laser Processing and Diagnostics (II) (Les Edition de Physique, Les Ulis Cedex 1986)Google Scholar
  83. 7.81
    D. Bäuerle (ed.): Laser Processing and Diagnostics, Springer Ser. Chem. Phys., Vol. 39 (Springer, Berlin, Heidelberg 1984)Google Scholar
  84. 7.82
    A.W. Johnson, D.J. Ehrlich, H.R. Schlossberg (eds.): Laser-Controled Chemical Processing of Surfaces (North-Holland, Amsterdam 1984)Google Scholar
  85. 7.83
    R.M. Osgood, S.R.J. Bruuk, H.R. Schlossberg (eds.): Laser Diagnostics and Photochemical Processing for Semiconductor Devices (North-Holland, Amsterdam 1983)Google Scholar
  86. 7.84
    J. Siejka, R. Srinivasan et al: In Interfaces Under Laser Irradiation, ed. by L.D. Laude, D. Bäuerle, M. Wautelet (Nijhoff, Boston 1987) p. 427Google Scholar
  87. 7.85
    S.D. Allen (ed.): Laser-Assisted Deposition, Etching and Doping (SPIE, Washington 1984)Google Scholar
  88. 7.86
    A. Johson, G. Loper, T. Sigmon (eds.): Laser- and Particle-Beam Chemical Processes on Surfaces, Symp. Proc. 129 (MRS, Pittsburgh 1989)Google Scholar
  89. 7.87
    D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: J. Vac. Sci. Technol. 21, 23 (1982)CrossRefGoogle Scholar
  90. 7.88
    D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: IEEE J. QE-16, 1231 (1980)Google Scholar
  91. 7.89
    M. Hanabusa, A. Namiki, K. Yoshihara: Appl. Phys. Lett. 35, 626 (1979)CrossRefGoogle Scholar
  92. 7.90
    R. Bilenchi, I. Gianinoni, M. Musci: J. Appl. Phys. 53, 6479 (1982)CrossRefGoogle Scholar
  93. 7.91
    P.K. Boyer, G.A. Roche, W.H. Ritchie, G.J. Collins: Appl. Phys. Lett. 40, 716 (1982)CrossRefGoogle Scholar
  94. 7.92
    T.F. Deutsch, D.J. Ehrlich, D.D. Rathman, D.J. Silversmith, R.M. Osgood: Appl. Phys. Lett. 39, 825 (1981)CrossRefGoogle Scholar
  95. 7.93
    K. Emery, P.K. Boyer, L.R. Tompson, R. Solanki, M. Sarnani, G.J. Collins: In Laser-Assisted Deposition, Etching and Doping, ed. by S.D. Allen (SPIE, Washington 1984) p. 9Google Scholar
  96. 7.94
    R. Solanki, P.K. Boyer, G.J. Collins: Appl. Phys. Lett. 41, 1048 (1982)CrossRefGoogle Scholar
  97. 7.95
    J.Y. Tsao, D.J. Ehrlich: In Laser-Assisted Deposition, Etching and Doping, ed. by S.D. Allen (SPIE, Washington 1984) p. 2Google Scholar
  98. 7.96
    D.J. Ehrlich, J.Y. Tsao: J. Vac. Sci. Technol. B1, 969 (1983)Google Scholar
  99. 7.97
    T.F. Detsch, D.J. Ehrlich, R.M. Osgood: Appl. Phys. Lett. 35, No. 2, 175 (1979)CrossRefGoogle Scholar
  100. 7.98
    F.A. Houle: In Laser-Assisted Deposition, Etching and Doping, ed. by S.D. Allen (SPIE, Washington 1984) p. 110 and references thereinGoogle Scholar
  101. 7.99
    D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: Appl. Phys. Lett. 40, 1018 (1981)CrossRefGoogle Scholar
  102. 7.100
    P.V. Podlesnik, N.N. Gilgen, R.M. Osgood, A. Sanches, V Daneu: Appl. Phys. Lett. 43, 1083 (1983)CrossRefGoogle Scholar
  103. 7.101
    R. Nowak, S. Metev, G. Sepold, K. Grosskopf: Glastechn. Berichte 66, 227 (1993)Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1998

Authors and Affiliations

  • Simeon M. Metev
    • 1
  • Vadim P. Veiko
    • 2
  1. 1.BIAS Bremen Institute of Applied Beam TechnologyBremenGermany
  2. 2.IFMO Institute of Fine Mechanics and OpticsSablinskaya 14Russia

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