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Very Large Scale Integration (VLSI) pp 295Cite as

Erratum to: Advanced Lithography

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Part of the book series: Springer Series in Electrophysics ((SSEP,volume 5))

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References

  1. M.P. Lepselter: Technical Digest IEDM, p.42, 1980

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Authors and Affiliations

  1. Office of ASN (R,E&S), The Pentagon, Washington, DC, 20350, USA

    David F. Barbe Ph.D.

Authors
  1. David F. Barbe Ph.D.
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Editors and Affiliations

  1. Office of ASN (R,E&S), The Pentagon, Washington, DC, 20350, USA

    David F. Barbe Ph.D.

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© 1982 Springer-Verlag Berlin Heidelberg

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Barbe, D.F. (1982). Erratum to: Advanced Lithography. In: Barbe, D.F. (eds) Very Large Scale Integration (VLSI). Springer Series in Electrophysics, vol 5. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88640-9_10

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  • DOI: https://doi.org/10.1007/978-3-642-88640-9_10

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-88642-3

  • Online ISBN: 978-3-642-88640-9

  • eBook Packages: Springer Book Archive

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