Abstract
SIMS has been used widely for surface chemistry studies, i.e. to try to identify species formed on metal or semiconductor surfaces during their reaction with the gaseous ambience, the latter being mostly oxygen. These studies can provide reliable information if the SIMS method is combined with other surface sensitive methods as TDMS [1], IRS [2], etc. One of us has developed a new method of using SIMS to measure oxygen adsorption on silicon surface [3]. The present paper deals with this method for the analysis of oxygen adsorption on aluminium and some aluminium alloys.
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References
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© 1982 Springer-Verlag Berlin Heidelberg
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Marton, D., Csanády, Á. (1982). SIMS Studies on Oxygen Adsorption on Aluminium and Its Alloys. In: Benninghoven, A., Giber, J., László, J., Riedel, M., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS III. Springer Series in Chemical Physics, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88152-7_59
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DOI: https://doi.org/10.1007/978-3-642-88152-7_59
Publisher Name: Springer, Berlin, Heidelberg
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