The Theory of Concentration Depth Profiling by Sputter Etching

  • W. O. Hofer
  • U. Littmark
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 19)


Concentration depth profiling by controlled erosion of surface layers by sputtering is generally hampered by distorting effects due to recoil mixing and radiation enhanced migration. Emphasis is placed here on recoil mixing where we distinguish between two different collisional relocation processes: primary recoil mixing, on the one hand, and cascade recoil mixing on the other. In spite of the higher average energy/range of primary recoils, cascade recoils are the dominating cause for recoil mixing; this is by virtue of their much higher number [1].


Depth Profile Concentration Depth Profile Depth Element Internal Profile Sputter Depth Profile 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    U. Littmark, W.O. Hofer: Nucl. Instrum. Methods 168 (1980) 329ADSCrossRefGoogle Scholar
  2. 2.
    T. Ishitani, R. Shimizu: Appl. Phys. 6 (1975) 241ADSCrossRefGoogle Scholar
  3. 3.
    P. Sigmund, A. Gras-Marti: Nucl. Instrum. Methods 168 (1980) 389ADSCrossRefGoogle Scholar
  4. 4.
    W.O. Hofer, H. Liebl: Appl. Phys. 8 (1975) 359ADSCrossRefGoogle Scholar
  5. 5.
    J.L. Whitton, G. Carter: Proc. Sympos. Sputtering, Perchtoldsdorf, Vienna, 1980, ed. by P. Varga et al., p.552Google Scholar
  6. 6.
    H.H. Andersen: Appl. Phys. 18 (1979) 131ADSCrossRefGoogle Scholar
  7. 7.
    H.W. Etzkorn, U. Littmark, J. Kirschner: Proc. Sympos Sputtering, Perchtoldsdorf, Vienna, 1980, ed. by P. Varga et al., p.542Google Scholar
  8. 8.
    S. Matteson: Appl. Phys. Lett. (to be published); see also the publications of this author in ref.9Google Scholar
  9. Numerous recent publications on Recoil Mixing can be found in the Proceedings 2nd Int. Conf. Ion Beam Modification of Materials, Albany, N.Y., 1980, ed. by R.E. Benenson et al. (North-Holland, Amsterdam 1981)Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1982

Authors and Affiliations

  • W. O. Hofer
    • 1
  • U. Littmark
    • 1
  1. 1.Institut für Grenzflächenforschung und VakuumphysikKernforschungsanlage JülichJülichFed. Rep. of Germany

Personalised recommendations