Abstract
Secondary ion mass spectrometry (SIMS) utilizes a beam of energetic primary ions to sputter away a solid [1] surface producing ionized sputtered particles which can be mass spectrometrically detected. This technique provides in-depth information on atomic constituents by recording one or more mass peaks as the sputtering process erodes the sample, thus producing the detected signal from increasingly greater depths beneath the original sample surface. This depth profiling technique has become one of the most important uses of SIMS, but the accuracy with which the data reflect the original atomic profile within the sample depends on many parameters. Several critical reviews on depth profiling exist in the Ref. [2,3,36] which broadly cover most aspects of this mode of analysis. The present work is limited to three major aspects: 1) depth resolution, 2) dynamic range, and 3) sensitivity. The relationships between these areas will be discussed, as well as how they influence the accuracy of the final profile.
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References
Recent studies (M. Barber, R.S. Bordoli, R.D. Sedgwick and A.N. Tyler, unpublished) have shown that liquids may also be sputtered to yield SIMS spectra.
E. Zinner, Scanning 3, 57 (1980)
S. Hofmann, Surf. Interface Anal. 2, 148 (1980)
H.W. Werner, Vacuum 20 (1974)
H.H. Andersen, Appl. Phys. 18, 139 (1979)
U. Littmark and W.O. Hofer, Nucl. Instrum. Meth. 168, 329 (1980)
J.A. McHugh, Rad. Eff. 21, 209 (1974)
Z.L. Liau, B.Y. Tsaur and J.W. Mayer, J. Vac. Sci. Tech. 16, 121 (1979)
I.S.T. Tsong, J.R. Monkowski and D.W. Hoffman, Nucl. Instrum. Meth. 182, 237 (1981)
H.F. Winters and J.W. Coburn, Appl. Phys. Lett. 28, 176 (1976)
C.W. Magee and W.L. Harrington, Appl. Phys. Lett. 33, 193 (1978)
R.E. Honig and W.L. Harrington, Thin Solid Films 19, 43 (1973)
R.E. Honig and C.W. Magee,“Proceedings of the 26th Annual Conference on Mass Spectrometry; p. 207, St. Louis (1978). Also included in Ref. 3.
J.W. Coburn, E.W. Eckstein and E. Kay, J. Appl. Phys. 46, 2828 (1975)
C.W. Magee, W.L. Harrington and R.E. Honig, Rev. Sci. Instrum. 49, 477 (1978)
D.E. Carlson and C.W. Magee, Appl. Phys. Lett. 33, 81 (1978)
Y. Limoge, R. Seguin and J.L. Séran, Proceedings of the 8th International Congress on“X-ray Optics and Microanalysis’, D.R. Beaman et al., Eds., ( Pendell, Midland, 1980 ) p. 347
R.D. Dupuis, P.D. Dapkus, C.M. Garner, C.Y. Su and W.E. Spicer, Appl. Phys. Lett. 34, 335 (1979)
W.O. Hofer and H. Liebl, Appl. Phys. 8, 359 (1975)
P. Williams, Appl. Phys. Lett. 36, 758 (1980)
T.A. Whatley, D.J. Comaford, J. Colby and P. Miller, in “Surface Analysis Techniques for Metallurgical Applications”, R.S. Carbonara and J.R. Cuthill, Eds., ASTM STP 596, Am. Soc. for Testing Mat., Philadelphia, (1976) p. 114
K. Wittmaack, Appl. Phys. 12, 149 (1977)
J.A. McHugh in “Methods of Surface Analysis”, S.P. Wolsky and A.W. Czanderna, Eds., ( Elsevier, Amsterdam, 1975 ) p. 223
K. Wittmaack, Appl. Phys. Lett. 37, 285 (1980)
D.K. Bakale, B.N. Colgy and C.A. Evans, Jr., Anal. Chem. 47, 1532 (1975)
J.-M. Gourgout, in Secondary Ion Mass Spectrometry SIMS-II, ed. by A. Benninghoven, C.A. Evans, Jr., R.A. Powell, R. Shimizu, H.A. Storms, Springer Series in Chemical Physics, Vol. 9 ( Springer, Berlin, Heidelberg, New York 1979 ) p. 286
C.W. Magee, J. Electrochem. Soc. 126, 660 (1979)
C.W. Magee and E.M. Botnick, J. Am. Vac. Soc. 19, 47 (1981)
C.A. Evans, Jr., unpublished
H.W. Werner, Acta Electron. 19, 53 (1976)
As in the instrument described in Ref. 15, and in direct imaging ion microscopes
K. Wittmaack, personal communication (1979)
R. Schubert and J.C. Tracy, Rev. Sci. Instrum. 44, 487 (1973)
V.R. Deline, C.A. Evans, Jr. and P. Williams, Appl. Phys. Lett. 33, 578 (1978)
V.R. Deline, W. Katz, C.A. Evans, Jr. and P. Williams, Appl. Phys. Lett. 33, 832 (1978)
K. Wittmaack, to be published
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Magee, C.W., Honig, R.E., Evans, C.A. (1982). Depth Profiling by SIMS: Depth Resolution, Dynamic Range and Sensitivity. In: Benninghoven, A., Giber, J., László, J., Riedel, M., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS III. Springer Series in Chemical Physics, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88152-7_27
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