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Molecule Formation in Oxide Sputtering

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Secondary Ion Mass Spectrometry SIMS III

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 19))

Abstract

The understanding of the formation process of sputtered oxide molecules, in particular of MeO (Me: metal), is important for a number of reasons, such as

  • an increased insight in surface processes induced by ion bombardment,

  • oxidation studies at solid surfaces by mass spectrometric methods like SIMS or SNMS (Sputtered Neutral Mass Spectrometry [1]),

  • the enhancement of secondary ion yields by oxygen exposure or bombardment

  • the great fraction of MeO in the flux of oxide specific sputtered particles consisting mainly of neutrals also for oxides.

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Authors and Affiliations

  1. Physikalisches Institut der Technischen, Universität Clausthal und Sonderforschungsbereich, 126 Göttingen-Clausthal, D-3392, Clausthal-Zellerfeld, Fed. Rep. of Germany

    H. Oechsner

Authors
  1. H. Oechsner
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Editor information

Editors and Affiliations

  1. Physikalisches Institut, Universität Münster, D-4400, Münster, Fed. Rep. of Germany

    A. Benninghoven

  2. Physical Institute of the Technical University, H-1111, Budapest, Hungary

    J. Giber  & J. László  & 

  3. Department of Physical Chemistry and Radiology, Eötvös University, H-1111, Budapest, Hungary

    M. Riedel

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1982 Springer-Verlag Berlin Heidelberg

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Oechsner, H. (1982). Molecule Formation in Oxide Sputtering. In: Benninghoven, A., Giber, J., László, J., Riedel, M., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS III. Springer Series in Chemical Physics, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88152-7_18

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  • DOI: https://doi.org/10.1007/978-3-642-88152-7_18

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-88154-1

  • Online ISBN: 978-3-642-88152-7

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