Abstract
The solution of the problem of local in-depth analysis of solids using secondary ion emission encounters difficulties related to effects produced by the walls of the crater resulting from ion etching. One of the ways to overcome these difficulties might be the formation of an intermediate ion image of the surface of the sample under study with subsequent separation of the image element of the required locality and its analysis with the aid of a mass filter. This simultaneously decreases the effect of non-uniform distribution of current density of the primary beam. Just this way was chosen in the laboratory of the Institute of Metal Physics, Acad. Sci. UkrSSR to design a dissector ion microanalyzer for the in-depth local analysis of the isotopic composition of solids and for the determination of impurity concentration profiles through the depth of the sputtered layer.
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© 1982 Springer-Verlag Berlin Heidelberg
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Cherepin, V.T., Ol’khovsky, V.L. (1982). Performance and Use of Dissector Ion Microanalyzer. In: Benninghoven, A., Giber, J., László, J., Riedel, M., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS III. Springer Series in Chemical Physics, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88152-7_12
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DOI: https://doi.org/10.1007/978-3-642-88152-7_12
Publisher Name: Springer, Berlin, Heidelberg
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