Pulsed Laser- Plasma Deposition of Thin Films, and Film Structures

  • Simeon M. Metev
  • Vadim P. Veiko
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 19)


The pulsed laser-plasma method is a novel, fast-developing technique for the synthesis of polycomponent thin-film materials and structures [8.1-6].


Substrate Temperature Schottky Barrier Film Property Vapour Flux Plasma Particle 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. 8.1
    D. Paine, J. Bravman (eds.): Laser Ablation for Materials Synthesis. Proc. MRS 191(1990)Google Scholar
  2. 8.2
    D. Chrisey, G. Hubler (eds.): Pulsed Laser Deposition of Thin Films(Wiley, New York 1993)Google Scholar
  3. 8.3
    F.E. Fogarassy, S. Lazare (eds.): Laser Ablation of Electronic Materials(North-Holland, Amsterdam 1992)Google Scholar
  4. 8.4
    J.C. Miller (ed.): Laser Ablation,Springer Ser. Mater. Sci., Vol.28 (Springer, Berlin, Heidelberg 1994)Google Scholar
  5. 8.5
    E. Fogarassy, D.. Geohegan, M. Stuke (eds.): Laser Ablation(North-Holland, Amsterdam 1996)Google Scholar
  6. 8.6
    R. Singh, D. Norton, L. Laude, J. Narayan, J. Cheung (eds.): Adanced Laser Processing of Materials -Fundamentals and ApplicationsMRS Symp. 397 (MRS, Pittsburgh, PA 1996)Google Scholar
  7. 8.7
    B.N. Chapman, J.C. Anderson (eds.): Science and Technology of Surf ace Coating(Academic, New York 1974)Google Scholar
  8. 8.8
    M. Kanuma: Film Deposition by Plasma Techniqus,Springer Ser. Atoms Plasmas (Springer, Berlin, Heidelberg 1992)Google Scholar
  9. 8.9
    J.L. Vossen, W. Kern (eds.): Thin Film Processes(Academic, New York 1978)Google Scholar
  10. 8.10
    R. Behrisch (ed.): Sputtering by Particle Bombardment I and II,Topics Appl. Phys., Vols.47 and52 (Springer, Berlin, Heidelberg 1981 and 1983)Google Scholar
  11. 8.10a
    R. Behrisch, K. Wittmaack (eds.): Sputtering by Particle Bombardment III,Topics Appl. Phys., Vol.64 (Springer, Berlin, Heidelberg 1991)Google Scholar
  12. 8.11
    B.A. Vyshnyakov, K.A. Osipov: Electron-Beam Method for Obtaining Films from Chemical Compounds(in Russian) (Nauka, Moscow 1970)Google Scholar
  13. 8.12
    B. Braren, J. Dubouski, D. Norton (eds.): Laser A blation in Materials Processing: Fundamentals and Applications. Proc. MRS 285 (1993)Google Scholar
  14. 8.13
    N.N. Rikalin, A.A. Uglov, N.B. Zuev: Fizika i Khimiya Obrabotki Materialov No. 1, 3 (1979)Google Scholar
  15. 8.14
    N.I. Glushchenko, N.E. Leshchenko, A.L. Rvachev: Fizika i Khimia Obrabotki Materialov 6, 139(1975)Google Scholar
  16. 8.15
    S. Metev: In Pulsed Laser Deposition of Thin Films,ed. by D. Chrisey, G. Hübler (Wiley, New York 1993)Google Scholar
  17. 8.16
    S. Metev: In Laser Processing and Diagnostics (II)ed by D. Bäuerle, K.L. Kompa, L. Laude (Les Edition de Physique, Les Ulis Cedex, 1986), p. 143Google Scholar
  18. 8.17
    J. Cheung, H. Sankur: CRCCrit. Rev. in Solid State and Mat. Sci. 15, 65(1988)Google Scholar
  19. 8.18
    S.Metev, M. Sendova: In Trends in Quantum Electronics,ed. by A.M. Prokhorov, I. Ursu, Vol. 1033 (SPIE, Bellingham 1988)p.260Google Scholar
  20. 8.19
    H. Sankur, J. Cheung: Appl. Phys. A47, 271 (1988)Google Scholar
  21. 8.20
    S. Metev, G. Sepold: Laser und Optoelektronik 21, 74(1989)Google Scholar
  22. 8.21
    S.Metev, K Meteva: In Laser Surface Microprocessing,ed. by V.I. Konov, B.S. Luk’yanchuk, I. Boyd, Proc. SPIE 1352, 68 (1989)Google Scholar
  23. 8.22
    S.Metev: In Micro System Technologies 90,ed. by H. Reichl (Springer, Berlin, Heidelberg 1990) p. 341 S.CrossRefGoogle Scholar
  24. 8.22a
    M. Ozegowski, G. Sepold, S. Burmester: Appl. Surf. Sci. 96–98, 122 (1995)Google Scholar
  25. 8.22b
    M. Ozegowski, S. Metev, G. Sepold, S. Burmester: MRS Proc. 397, 479 (Mater. Res. Soc., Pittsburgh, PA 1996)Google Scholar
  26. 8.22c
    M. Ozegowski, S. Metev, G. Sepold: Appl. Surf. Sci. (1998) in printGoogle Scholar
  27. 8.23
    S.V. Gaponov: In L aser-A ssisted Modification and Synthesis of Materials,ed. by S. Metev (Sofia Univ. Press, Sofia 1985), p.216Google Scholar
  28. 8.24
    A.D. Akhsakhalyan, B.A. Biryutin, S.V. Gaponov, A.A. Gudkov, V.I. Luchin: Sov. Phys. -Tech. Phys. 27, 969(1982)Google Scholar
  29. 8.25
    A.D. Akhsakhalyan, B.A. Biryutin, S.V. Gaponov, A.A. Gudkov, V.I. Luchin: Sov. Phys. -Tech. Phys. 27, 973 (1982)Google Scholar
  30. 8.26
    M. Sendova: J. Mat. Sci. Lett. 6, 285 (1987)CrossRefGoogle Scholar
  31. 8.27
    S.V. Gaponov, A.A. Gudkov, A.A. Faerman: Sov. Phys. Tech. Phys. 27, 1843 (1982)Google Scholar
  32. 8.28
    S.V. Gaponov, A.A. Gudkov, V.M. Luskin, V.I. Luchin, N.N. Salashchenko: Pis’ma Zh. Tekh. Fiz. 5, 475 (1979) [Engl. transl.: Sov. Tech. Phys. Lett. 5 (1979)]Google Scholar
  33. 8.29
    S. Metev, K. Meteva: Appl. Surf. Sci. 43, 402 (1989)CrossRefGoogle Scholar
  34. 8.30
    J.A. Venables, G.D.T. Spiller, M. Hanbuecken: Rep. Prog. Phys. 47, 399(1984)CrossRefGoogle Scholar
  35. 8.31
    D. Kashchiev: J. Cryst. Growth40, 29(1977)CrossRefGoogle Scholar
  36. 8.32
    D. Kashchiev: Thin SolidFilms55, 399(1978)CrossRefGoogle Scholar
  37. 8.33
    S.V. Gaponov, N.N. Salashchenko: Elektronnaya Promishlenost No.l, 11(1976)Google Scholar
  38. 8.34
    Yu.A. Bikovskij, V.M. Boyakov: Zh. Tekh. Fiz. 48, 991 (1978) [Engl. transl.: Sov. Phys. Tech. Phys. 23, 780(1978)]Google Scholar
  39. 8.35
    S.M. Bedair, H.P. Smith: Appl. Phys. Lett. 40, 4776(1969)Google Scholar
  40. 8.36
    S.V. Gaponov, V.I. Lugin, G.A. Maksimov, N.N. Salashchenko, V.P. Smirnov: Khimiya i Khimicheskaya Tekhnologiya No. 1, 33 (1975)Google Scholar
  41. 8.37
    D. Dimitrov, S. Metev, I. Gugov, V. Kozhukharov: J. Mat. Sci. Lett. No.l, 334 (1982)CrossRefGoogle Scholar
  42. 8.38
    M. Mitrikov, D. Dimitrov, S. Metev: J. Phys. D 17, 1563 (1984)CrossRefGoogle Scholar
  43. 8.39
    M. Mitrikov, D. Dimitrov, S. Metev: Jpn. J. Appl. Phys. 24, 167 (1985)Google Scholar
  44. 8.40
    N.N. Salashchenko, O.N. Filatov: Fiz. Tekh. Poluprovod. 13, 1748 (1979) [Engl. transl.: Sov. Phys. Semicond. 13, 1017(1979)]Google Scholar
  45. 8.41
    A.I. Golovashkin, E.V. Ekimov, S.I. Krasnosvobodtsev, V. Pechen: JETP Lett. 47, 191(1988)Google Scholar
  46. 8.42
    T. Fork, J.B. Boyce, F.A. Ponceetal: Appl. Phys. Lett. 53, 337(1988)CrossRefGoogle Scholar
  47. 8.43
    T. Venkatesan, X.D. Wu, A. Inametal: Appl. Phys. Lett. 53, 1431(1988)CrossRefGoogle Scholar
  48. 8.44
    B. Pashmakov, D. Nesheva, S. Metev, D. Dimitrov, E. Vateva: J. Mat. Sci. Lett. 4,442(1985)CrossRefGoogle Scholar
  49. 8.45
    M. Baleva, A. Yordanov, S. Metev: Annuaire de l’Universitede Sofia (1984)p. 121Google Scholar
  50. 8.46
    M. Baleva, M. Maximov, S. Metev, M. Sendova: J. Mat. Sci. Lett. 5, 533 (1986)CrossRefGoogle Scholar
  51. 8.47
    M. Baleva, M. Maximov, S. Metev, M. Sendova: Rev. Roum. Phys. 31, 1037 (1986)Google Scholar
  52. 8.48
    S.V. Gaponov, E.B. Klyuenkov, B.a. Nestorov, N.N. Salashchenko, M.I. Haifetz: Pis’ma Zh. Tekh. Fiz. 5, 472 (1979) [Engl. transl.: Sov. Tech. -Phys. Lett. 5,382(1979)]Google Scholar
  53. 8.49
    S.V. Gaponov, V.M. Luskin, N.N. Salashchenko: Fiz. Tekh. Poluprovod. 14, 1468 (1980) [Engl. transl.: Sov. Phys. -Semicond. 14, 873 (1980)]Google Scholar
  54. 8.50
    T. Chakraborty, P. Pietiläinen: The Fractional Quantum Hall Effect,Springer Ser. Solid-State Sci., Vol. 85 (Springer, Berlin, Heidelberg 1988)CrossRefGoogle Scholar
  55. 8.51
    S.V. Gaponov, V.M. Luskin, N.N. Salashchenko: JETP Lett. 33, 533 (1981)]Google Scholar
  56. 8.52
    Yu.A. Bityurin, S.V. Gaponov, T.V. Postnikova: Sov. Phys. -Tech. Phys. 26, 728(1981)Google Scholar
  57. 8.53
    S. Gaponov, M. Strikovski: Sov. Phys. Tech. Phys. 28, 754 (1983)Google Scholar
  58. 8.54
    A.D. Akhsakhalyan, S.V. Gaponov, S.A. Gusev, V.I. Luchin, Yu.Ya. Platonov, N.N. Salashchenko: Sov. Phys. -Tech. Phys. 29, 446(1984)Google Scholar
  59. 8.55
    A.D. Akhsakhalyan, S.V. Gaponov, S.A. Gusev, Yu.Ya. Platonov, N.N. Salashchenko, N.I. Polushkin: Nuc. Instr. Meth. Phys. Res. A 216, 75 (1987)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1998

Authors and Affiliations

  • Simeon M. Metev
    • 1
  • Vadim P. Veiko
    • 2
  1. 1.BIAS Bremen Institute of Applied Beam TechnologyBremenGermany
  2. 2.IFMO Institute of Fine Mechanics and OpticsSt. PetersburgRussia

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