Geometrical Analysis of Mask Pattern for VLSI and its Application
An original definition is presented of four distances between two segments at any angle that are not uniquely-defined in plane geometry. A systematic method for generation of proper shapes for near-by regions within a fixed distance between segment sequences is also presented. These are indispensable for the checking of layout design rules pertaining to mask pattern data including diagonal edges.
Using this geometrical analysis, we have developed a high performance pattern checker, MACH (Mask Artwork CHecking program), that can detect all design rule errors and visualize them on a color graphic terminal. MACH performs well in VLSI pattern checking. This program has been applied to more than one hundred LSIs since April 1981.
KeywordsAssure Clarification Hgse
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