Geometrical Analysis of Mask Pattern for VLSI and its Application
An original definition is presented of four distances between two segments at any angle that are not uniquely-defined in plane geometry. A systematic method for generation of proper shapes for near-by regions within a fixed distance between segment sequences is also presented. These are indispensable for the checking of layout design rules pertaining to mask pattern data including diagonal edges.
Using this geometrical analysis, we have developed a high performance pattern checker, MACH (Mask Artwork CHecking program), that can detect all design rule errors and visualize them on a color graphic terminal. MACH performs well in VLSI pattern checking. This program has been applied to more than one hundred LSIs since April 1981.
KeywordsPlane Geometry Geometrical Analysis Design Rule Fixed Distance Mask Pattern
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- P. Wilcox, H. Rombeek, and D. M. Caughey, “Design Rule Verification Based on One Dimensional Scans”, Proc. of the 15th DA Conf., June 1978, pp. 285–289.Google Scholar
- D. Alexander, “A Technology Independent Design Rule Checker”, 3rd USA-JAPAN Computer Conf., 1978, pp. 412–416.Google Scholar
- C. R. McCaw, “Unified Shapes Checker — A Checking Tool for LSI”, Proc. of the 16th DA Conf., June 1979, pp. 81–87.Google Scholar
- T. Kozawa, A. Tsukizoe, J. Sakemi, C. Miura, and T. Ishii, “A Concurrent Pattern Operation Algorithm for VLSI Mask Data”, Proc. of the 18th DA Conf., June 1981, pp. 563–570.Google Scholar