Abstract
Observations regarding a number of defects in 6H-SiC single crystals grown by the sublimation method and the dependence of these defects on source materials and pressure are reported in this paper. A SiC source with unintentional impurities resulted in the creation of a number of striated defects during the initial stage of crystal growth. Three kinds of etch pits (EP-1, EP-2 and EP-3) were observed. The incidence of small-size EP-3 etch pits was found to be effectively reduced by increasing the processing pressure. 6H-SiC single crystals with a lower defect density were fabricated using pure source material at 2300°C: Etch pit densities were <x103, 5.2×103 and 2.2×104 cm−2 for EP-1, EP-2 and EP-3, respectively.
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© 1992 Springer-Verlag Berlin Heidelberg
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Koga, K., Fujikawa, Y., Ueda, Y., Yamaguchi, T. (1992). Growth and Characterization of 6H-SiC Bulk Crystals by the Sublimation Method. In: Yang, C.Y., Rahman, M.M., Harris, G.L. (eds) Amorphous and Crystalline Silicon Carbide IV. Springer Proceedings in Physics, vol 71. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84804-9_12
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DOI: https://doi.org/10.1007/978-3-642-84804-9_12
Publisher Name: Springer, Berlin, Heidelberg
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