Abstract
Cold plasmas are generated by certain types of gas discharges at low pressure. As each discharge has its own characteristics, the type of discharge has to be chosen appropriately for the purpose of its application.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
A. von Engel: Ionized Gases, 2nd edn. ( Clarendon, Oxford 1965 )
M.J. Druyvesteyn, F.M. Penning: Rev. Mod. Phys. 12, 87 (1940)
S. Takeda: Denki Gakkai Shi 71, 13 (1951)
A. von Engel: Electric Plasmas: Their Nature and Uses( Taylor and Francis, London 1983 )
Electric Discharge Handbook (Denki Gakkai, Tokyo 1973)
B.E. Warner, K.B. Persson, G.J. Collins: J. Appl. Phys. 50, 5694 (1979)
D.J. Sturges, H.J. Oskam: J. Appl. Phys. 35, 2887 (1964)
R. Bleekrode, W. van Benthem: J. Appl. Phys. 40, 5274 (1969)
H. Koch, H.J. Eichler: J. Appl. Phys. 54, 4939 (1983)
J.L. Vossen: J. Electrochem. Soc. 126, 319 (1979)
H.R. Koenig, L.I. Maissel: IBM J. Res. Dev. 14, 168 (1970)
H. Norström: Vacuum 29, 341 (1979)
H.S. Butler, G.S. Kino: Phys. Fluids 6, 1346 (1963)
R.T.C. Tsui: Phys. Rev. 168, 107 (1968)
M.D. Gill: Vacuum 34, 357 (1984)
J.W. Coburn, E. Kay: J. Appl. Phys. 43, 4965 (1972)
R.G. Bossio, C.F. Weissfloch, M.R. Wertheimer: J. Microwave Power 7, 325 (1972)
R.G. Bossio, M.R. Wertheimer, C.F. Weissfloch: J. Phys. E 6, 628 (1973)
S. Matsuo, Y. Adachi: Jpn. J. Appl. Phys. 21, L4 (1982)
Y. Ino, M. Sasaki, K. Numajiri: Semiconductor World 1985 1, 73
S. Matsuo, M. Kiuchi: Jpn. J. Appl. Phys. 22, L210 (1983)
K. Suzuki, S. Okudaira, N. Sakudo, I. Kanomata: Jpn. J. Appl. Phys. 16, 1979 (1977)
N. Sakudo, K. Takiguchi, H. Koike, I. Kanomata: Rev. Sci. Instrum. 43, 762 (1977)
R. Limpaecher, K.R. MacKenzie: Rev. Sci. Instrum. 44, 726 (1973)
R.R. Burke, C. Pomot: Solid State Technol. 31, 67 (1988)
S. Manly: J. Appl. Phys. 63, 1022 (1988)
W.P. Allis: Proc. 3rd Int’1 Conf. on Ionization Phenomena (1950) p.50
T. Musha: J. Phys. Soc. Jpn. 17, 1447 (1962)
F. Jansen, D. Kuhman, C. Taber: J. Vac. Sci. Technol. A 7, 3176 (1989)
R.R. Burke, C. Pomot: Appl. Surf. Sci. 36, 267 (1989)
Engel, A. von.: Ionized Gases, 2nd edn. ( Clarendon, Oxford 1965 )
Engel, A. von.: Electric Plasmas: Their Nature and Uses( Taylor and Francis, London 1983 )
Franklin, R.N.: Plasma Phenomena in Gas Discharges( Clarendon, Oxford 1976 )
Kunhardt, E.E., L.H. Lussen (eds.): Electrical Breakdown and Discharges in Gases, Part A: Fundamental Processes and Breakdown, Part B: Macroscopic Processes and Discharges (Plenum, New York 1983 )
MacDonald, A.D.: Microwave Breakdown in Gases( Wiley, New York 1966 )
Author information
Authors and Affiliations
Rights and permissions
Copyright information
© 1992 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Konuma, M. (1992). Generation of Cold Plasma. In: Film Deposition by Plasma Techniques. Springer Series on Atoms+Plasmas, vol 10. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84511-6_3
Download citation
DOI: https://doi.org/10.1007/978-3-642-84511-6_3
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-84513-0
Online ISBN: 978-3-642-84511-6
eBook Packages: Springer Book Archive