Abstract
Surface electromigration processes of Au on Si(111) were studied by reflection electron microscopy (REM). Migration processes depended on the adsorbate structure: Au atoms on the \(\sqrt 3 \times \sqrt 3\) adsorbate structure did not show electromigration, while Au atoms on the 5×2 structure showed electromigration in a direction antiparallel to the current. Au atoms migrated not only on the adsorbate structure but also on substrate Si surfaces, resulting in formation of patches of the 5×2 and 7×7 structures. These results were compared with those reported by Yasunaga et al. Preferential spread of one domain of the 5×2 structure were noted by the present REM method.
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© 1992 Springer-Verlag Berlin, Heidelberg
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Yamanaka, A., Tanishiro, Y., Yagi, K. (1992). Surface Electromigration of Au on Si(111) Studied by REM. In: Yoshimori, A., Shinjo, T., Watanabe, H. (eds) Ordering at Surfaces and Interfaces. Springer Series in Materials Science, vol 17. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84482-9_24
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DOI: https://doi.org/10.1007/978-3-642-84482-9_24
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