Surface Electromigration of Au on Si(111) Studied by REM

  • A. Yamanaka
  • Y. Tanishiro
  • K. Yagi
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 17)

Abstract

Surface electromigration processes of Au on Si(111) were studied by reflection electron microscopy (REM). Migration processes depended on the adsorbate structure: Au atoms on the \(\sqrt 3 \times \sqrt 3\) adsorbate structure did not show electromigration, while Au atoms on the 5×2 structure showed electromigration in a direction antiparallel to the current. Au atoms migrated not only on the adsorbate structure but also on substrate Si surfaces, resulting in formation of patches of the 5×2 and 7×7 structures. These results were compared with those reported by Yasunaga et al. Preferential spread of one domain of the 5×2 structure were noted by the present REM method.

Keywords

Migration Auger Congo 

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Copyright information

© Springer-Verlag Berlin, Heidelberg 1992

Authors and Affiliations

  • A. Yamanaka
    • 1
  • Y. Tanishiro
    • 1
  • K. Yagi
    • 1
  1. 1.Physics DepartmentTokyo Institute of TechnologyOh-okayama, Meguro, Tokyo 152Japan

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