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Ion and Laser Beam Processing of Semiconductors: Phase Transitions in Silicon

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Electronic Materials

Part of the book series: Springer Series in Solid-State Sciences ((SSSOL,volume 95))

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Abstract

The use of energetic ion and laser beams to analyze and modify surfaces has had a profound impact on the development of many areas of materials science. This scientific field is very large in scope and here we will concentrate on the best understood and most technologically important subject: Si processing science and technology. The emphasis will be on what new properties have been discovered or what new phenomena have been explored using ion or laser beams. Although the physics of the beam/solid interactions are different for ions or lasers, there is a commonality between the two subjects. These techniques have led to a better understanding of many phenomena, from energy transfer to defect reactions. The biggest impact however, on materials science has probably been in the areas of phase transitions and crystal growth and these are the areas we will discuss. The beam techniques have resulted in new findings in the three commonly recognized condensed phases of Si: crystalline (c), amorphous (a) and liquid (1).

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© 1991 Springer-Verlag Berlin Heidelberg

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Poate, J.M. (1991). Ion and Laser Beam Processing of Semiconductors: Phase Transitions in Silicon. In: Chelikowsky, J.R., Franciosi, A. (eds) Electronic Materials. Springer Series in Solid-State Sciences, vol 95. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84359-4_12

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  • DOI: https://doi.org/10.1007/978-3-642-84359-4_12

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-84361-7

  • Online ISBN: 978-3-642-84359-4

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