Abstract
The use of energetic ion and laser beams to analyze and modify surfaces has had a profound impact on the development of many areas of materials science. This scientific field is very large in scope and here we will concentrate on the best understood and most technologically important subject: Si processing science and technology. The emphasis will be on what new properties have been discovered or what new phenomena have been explored using ion or laser beams. Although the physics of the beam/solid interactions are different for ions or lasers, there is a commonality between the two subjects. These techniques have led to a better understanding of many phenomena, from energy transfer to defect reactions. The biggest impact however, on materials science has probably been in the areas of phase transitions and crystal growth and these are the areas we will discuss. The beam techniques have resulted in new findings in the three commonly recognized condensed phases of Si: crystalline (c), amorphous (a) and liquid (1).
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
R.S. Ohl: Bell Syst. Tech. J. 31, 104 (1952)
W. Shockley: U.S. Patent 2, 787, 564
J.M. Poate, J.M.Mayer: Laser Annealing of Semiconductors (Academic, New York 1982)
J.W. Mayer, L. Eriksson, JA. Davies: Ion Implantation in Semiconductors (Academic, New York 1970)
R.G. Wilson, G.R. Brewer: Ion Beams with Applications to Ion Implantation (Wiley, New York 1973)
G. Dearnaley, J.H. Freeman, R.S. Nelson, J. Stephens: Ion Implantation (North-Holland, Amsterdam 1973)
B. Smith: Ion Implantation Range Data for Si and Ge Device Technologies (Research Studies Press, Forest Grove, OR 1977)
J. Lindhard, M.E. Scharff, H.E. Schiott: K. Dan. Vidensk. Selsk., Mat. Fys. Medd. 13, No. 14 (1963)
W.C. Hofker: Philips Res. Rep. Suppl., No. 8 (1975)
J. Fletcher, J. Narayan, O.N. Holland: In Microcospy of Semiconducting Materials 1981, Inst, of Phys. Conf. Ser., Vol. 60, ed. by A.G. Cullis, D.C. Joy (Inst, of Phys., Bristol 1981) p. 295
G.L. Olson, J.A. Roth: Mater. Sci. Rep. 3, 1 (1988)
T.E. Scidel: In VLSI Technology, ed. by S.M. Sze (Wiley, New York 1983) Chap. 6
J.M. Poate, J. Linnros, F. Priolo, D.C. Jacobson, J.L. Batstone, M.O. Thompson: Phys. Rev. Lett. 60, 1322 (1988)
K.A. Jackson: J. Mater. Res. 3, 1218 (1988)
B. Chalmers: Principles of Solidification (Wiley, New York 1964)
J.S. Williams: In Surface Modification and Alloying, ed. by J.M. Poate, G. Foti, D.C. Jacobson (Plenum, New York 1983) Chap. 5
J.M. Poate, D.C. Jacobson, J.S. Williams, R.G. Elliman, D.O. Boerma: Nucl. Instrum. Methods B19/20, 480 (1987)
M. Reinelt, S. Kalbitzer: J. de Phys. Colloq. C4, 843 (1981)
S. Kalbitzer, M. Reinelt, W. Stolz: In Proc. of the 4th EC Photovoltaic Solar Energy Conference, Stesa, May 1982, ed. by WH. Bloss, G. Grassi (Reidel, Dordrecht, Holland 1982) p. 163
R.B. Fair: In Impurity Doping Processes in Silicon, ed. by F.F.Y. Wang (North-Holland, New York 1981) Chap. 7
S. Coffa, L. Calcagno, S.U. Campisano, G. Calleri, G. Ferla: J. Appl. Phys. 64, 6291 (1988)
D.C. Jacobson, J.M. Poate, G.L. Olson: Appl. Phys. Lett. 48, 118 (1986)
F. Priolo, J.M. Poate, D.C. Jacobson, J. Linnros, J.L. Batstone, S.U. Campisano: Appl. Phys. Lett. 52, 1213 (1988); Nucl. Instrum. Methods B 39, 343 (1989)
B.G. Bagley, H.S. Chen: AIP Conf. Proc. 50, 97 (1979)
F. Spaepen, D. Turnbull: AIP Conf. Proc. 50, 73 (1979)
E.P. Donovan, F. Spaepen, D. Turnbull, J.M. Poate, D.C. Jacobson: J. Appl. Phys. 57, 1795 (1985)
P. Baeri, G. Foti, J.M. Poate, S.U. Campisano, A.G. Cullis: Appl. Phys. Lett. 38, 800 (1981)
F. Priolo, J.M. Poate, D.C. Jacobson, J.L. Batstone, J.S. Custer, M.O. Thompson: Appl. Phys. Lett. 53, 2486 (1988)
J.M. Poate: In Laser and Electron-Beam Interactions with Solids, Mater. Res. Soc. Proc., Vol.4, ed. by B.R. Appleton, G.K. Celler (North-Holland, New York 1982) p. 121
S.U. Campisano, D.C. Jacobson, J.M. Poate, A.G. Cullis, N.G. Chew: Appl. Phys. Lett. 46, 846 (1985)
D.H. Auston, CM. Surko, T.N.C. Venkatesan, R.E. Slusher, J.A. Golovchenko: Appl. Phys. Lett. 33, 437 (1978)
GJ. Galvin, M.O. Thompson, J.W. Mayer, R.B. Hammond, N. Paulter, P.S. Peercy: Phys. Rev. Lett. 48, 33 (1982)
P.S. Peercy, M.O. Thompson: In Energy Beam-Solid Interactions and Transient Thermal Processing, Mater. Res. Soc. Proc., Vol. 35, ed. by D.K. Biegelsen, G. Rozgonyi, C. Shank (Materials Research Socienty, Pittsburgh, PA 1985) p. 53
M.O. Thompson, G.J. Galvin, J.W. Mayer, P.S. Peercy, J.M. Poate, D.C. Jacobson, A.G. Cullis, N.G.Chew: Phys. Rev. Lett. 52, 2360 (1984)
P.L. Liu, R. Yen, N. Bloembergen, R.T. Hodgson: Appl. Phys. Lett. 34, 864 (1979)
R. Tsu, R.T. Hodgson, T.Y. Tan, J.E.E. Baglin: Phys. Rev. Lett. 42, 1358 (1979)
M.O. Thompson, J.W. Mayer, A.G. Cullis, H.C. Webber, N.G. Chew, J.M. Poate, D.C. Jacobson: Phys. Rev. Lett. 50, 896 (1983)
G. Gore: Philips. Mag. 9, 73 (1855)
S. Roorda, S. Doom, W.C. Sinke, P.M.L.O. Scholte, E. van Loenen: Phys. Rev. Lett. 62, 1880 (1989)
EJP. Donovan, F. Spaepan, J.M. Poate, D.C. Jacobson: Appl. Phys. Lett. 55, 1516 (1989)
S. Roorda, J.M. Poate, D.C. Jacobson, D.J. Eaglesham, B.S. Dennis, S. Dierker, W.C. Sinke, F. Spaepen: Solid State Commun. 75, 197 (1990)
S. Roorda, J.M. Poate, D.C. Jacobson, B.S. Dennis, S. Dierker, W.C. Sinke: Appl. Phys. Lett. 56, 2097 (1990)
A. Polman, D.C. Jacobson, S. Coffa, J.M. Poate, S. Roorda, W.C. Sinke: Appl. Phys. Lett. 57, 1230 (1990)
S. Coffa, J.M. Poate, D.C. Jacobson, A. Polman: Appl. Phys. Lett., in press
S. Coffa, J.M. Poate, D.C. Jacobson, W. Frank: To be published
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1991 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Poate, J.M. (1991). Ion and Laser Beam Processing of Semiconductors: Phase Transitions in Silicon. In: Chelikowsky, J.R., Franciosi, A. (eds) Electronic Materials. Springer Series in Solid-State Sciences, vol 95. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84359-4_12
Download citation
DOI: https://doi.org/10.1007/978-3-642-84359-4_12
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-84361-7
Online ISBN: 978-3-642-84359-4
eBook Packages: Springer Book Archive