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Rate of Electron—Phonon Relaxation in Niobium

  • K. M. Yoo
  • X. M. Zhao
  • M. Siddique
  • R. R. Alfano
  • D. P. Osterman
  • M. Radparvar
  • J. Cunniff
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 53)

Abstract

Thermal modulation measurements using 120 fs /620 nm laser pulses were performed on niobium films. The electron-phonon relaxation time was found to be ultra fast and measured to be 360 fs, and the electron-phonon coupling constant was estimated to be 17× 1017 W m −3 K −1.

Keywords

Probe Beam Pump Beam Josephson Junction Lattice Temperature Niobium Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin, Heidelberg 1990

Authors and Affiliations

  • K. M. Yoo
    • 1
  • X. M. Zhao
    • 1
  • M. Siddique
    • 1
  • R. R. Alfano
    • 1
  • D. P. Osterman
    • 2
  • M. Radparvar
    • 2
  • J. Cunniff
    • 2
  1. 1.Institute for Ultrafast Spectroscopy and Lasers, Department of Electrical EngineeringCity College of the City University of New YorkNew YorkUSA
  2. 2.HYPRES Inc.ElmsfordUSA

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