Abstract
We have measured soft x-ray photoemission and photon stimulated desorption (PSD) from silicon surfaces which were etched by XeF2. These surfaces are covered with a layer approximately 20Å thick composed of a mixture of silicon fluoride reaction intermediates. The relative intensities of both photoemission and PSD spectral features arising from each of the various SiFx species depends strongly on the structure of the overlayer. Since photoemission measurements probe the entire reaction layer and PSD is sensitive to only the very outermost atomic layer, a comparison of these data can reveal structural details. The relative proportion of fluorides measured with photoemission varied slightly from run to run, but always showed a mixture of SiF, SiF2 and SiF3, along with a small amount of trapped SiF4. The species observed with PSD, however, varied considerably more than the corresponding photoemission spectra. Some surfaces showed only SiF3 spectral features while others showed features indicative of all three of the subfluorides. The implications of these results on the structure of the reaction layer are discussed.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsPreview
Unable to display preview. Download preview PDF.
References
F.A. Houle, J. Appl. Phys. 60, 3018 (1986).
H.F. Winters and F.A. Houle, J. Appl. Phys. 54,1218 (1983).
M.J. Vasile and F.A. Stevie, J. Appl. Phys. 53, 3799 (1982).
F.R. McFeely, J.F. Morar and F.J. Himpsel, Surf. Sci. 165, 277 (1986).
J.A. Yarmoff and F.R. McFeely, Phys. Rev. B 38, 2057 (1988).
F.R. McFeely, B.D. Silverman, J.A. Yarmoff and U.O. Karlsson in Proceedings of the Eighth International Symposium on Plasma Chemistry, edited by K. Akashi and A. Kinbara (International Union of Pure and Applied Chemistry, Tokyo, Japan, 1987), p. 927.
J.A. Yarmoff and F.R. McFeely in Photon Beam and Plasma Stimulated Chemical Processes at Surfaces, edited by V.M. Donnelly, LP. Herman and M. Hirose (Material Research Society, Pittsburgh, PA, 1987), p. 451.
F.J. Himpsel, P. Heimann, T.-C. Chiang and D.E. Eastman, Phys. Rev. Lett. 45,1112 (1980).
D.E. Eastman, J.J. Donelon, N.C. Hein and F.J. Himpsel, Nucl. Instrum. Methods 172, 327 (1980).
F.R. McFeely, J.F. Morar, N.D. Shinn, G. Landgren and F.J. Himpsel, Phys. Rev. B 30, 764 (1984).
J.A. Yarmoff and S.A. Joyce in Synchrotron Radiation in Materials Research, edited by J.H. Weaver, J. Gland and R. Clarke (Materials Research Society Symposium Proceedings, Pittsburgh, PA, 1989), p.
J.A. Yarmoff and S.A. Joyce, Phys. Rev. B 40, 3143 (1989).
J.A. Yarmoff, A. Taleb-Ibrahimi, F.R. McFeely and P. Avouris, Phys. Rev. Lett. 60, 960 (1988).
H. Friedrich, B. Pittel, P. Rabe, W.H.E. Schwarz and B. Sonntag, J. Phys. B13,25 (1980).
R.A. Rosenberg, J. Vac. Sci. Technol. A 2,1463 (1986).
F.R. McFeely, B. Robinson, J.A. Yarmoff and S.A. Joyce, to be published.
F.J. Himpsel, F.R. McFeely, A. Taleb-Ibrahimi, J.A. Yarmoff and G. Hollinger, Phys. Rev. B 38, 6084 (1988).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1990 Springer-Verlag Berlin, Heidelberg
About this paper
Cite this paper
Yarmoff, J.A., Joyce, S.A., Lo, C.W., Song, J. (1990). Photon Stimulated Desorption of Fluorine from Silicon Etched by XeF2 . In: Betz, G., Varga, P. (eds) Desorption Induced by Electronic Transitions DIET IV. Springer Series in Surface Sciences, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-84145-3_7
Download citation
DOI: https://doi.org/10.1007/978-3-642-84145-3_7
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-84147-7
Online ISBN: 978-3-642-84145-3
eBook Packages: Springer Book Archive