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Progress in Ion Projection Lithography

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Physics and Technology of Submicron Structures

Part of the book series: Springer Series in Solid-State Sciences ((SSSOL,volume 83))

Abstract

Ion protection lithography (IPL) uses demagnifying ion optics to project open stencil mask structures onto a substrate with reduced (.. 5x, 10x, ..) scale [1]. The IPL technique offers high throughput potential by using duoplasmatron ion sources with high angular current densities [2] and with virtual source sizes of less than 10 pm. Thus, for organic resists, chip exposure times of ≤ 0.1 sec are easily obtained.

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References

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Author information

Authors and Affiliations

  1. IMS — Ion Microfabrication Systems GmbH, Schreygasse 3, A-1020, Vienna, Austria

    G. Stengl, H. Löschner & E. Hammel

Authors
  1. G. Stengl
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  2. H. Löschner
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  3. E. Hammel
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Editor information

Editors and Affiliations

  1. Institut für Experimentalphysik, Universität Linz, A-4040, Linz, Austria

    Helmut Heinrich

  2. Institut für Physik, Montanuniversität Leoben, A-8700, Leoben, Austria

    Günther Bauer

  3. Institut für Festkörperphysik, Universität Wien, A-1090, Wien, Austria

    Friedemar Kuchar

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© 1988 Springer-Verlag Berlin Heidelberg

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Stengl, G., Löschner, H., Hammel, E. (1988). Progress in Ion Projection Lithography. In: Heinrich, H., Bauer, G., Kuchar, F. (eds) Physics and Technology of Submicron Structures. Springer Series in Solid-State Sciences, vol 83. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-83431-8_6

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  • DOI: https://doi.org/10.1007/978-3-642-83431-8_6

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-83433-2

  • Online ISBN: 978-3-642-83431-8

  • eBook Packages: Springer Book Archive

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