SIMS/XPS Studies of Surface Reactions on Rh(111) and Rh(331)
The adsorption of NO and HCN on Rh surfaces can be monitored using the Rh2NO+ or RhHCN+ molecular cluster ions formed in static SIMS. From parallel XPS studies, for example, we find that NO adsorbs molecularly at 300K on Rh(111) but dissociates significantly on the Rh(331) surface. This dissociation is accompanied by a decrease in the Rh2NO+ ion yield and an increase in the Rh2N+ and Rh2O+ ion intensities. This type of chemical specificity illustrates that SIMS studies are possible on more complex systems which are difficult to monitor using XPS alone.
KeywordsNitric Oxide Atomic Step Hydrogen Cyanide Submonolayer Coverage Rhodium Surface
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