Improvement of an Ion Microprobe Mass Analyzer (IMMA)

  • K. Miethe
  • A. Pöcker
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 44)

Abstract

For the analysis of dopant elements in semiconductors an intense primary ion beam, high transmission efficiency for the secondary ion mass spectrometer and sensitive detection of secondary ions are essential. We found that the performance of our IMMA (manufacturer Applied Research Laboratories) could be improved in these areas.

Keywords

Chromium GaAs Assure Cesium Tantalum 

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References

  1. 1.
    W. Bedrich, B. Koch, H. Mai, U. Seidenkranz, H. Syhre and R. Voigtmann, SIMS III (Proc. Int. Conf., Eds. A. Benninghoven et al) Springer Verlag Berlin 1979, p. 81Google Scholar
  2. 2.
    B.L. Bentz and H. Liebl, ibid, p. 30Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1986

Authors and Affiliations

  • K. Miethe
    • 1
  • A. Pöcker
    • 1
  1. 1.Forschungsinstitut der Deutschen BundespostDarmstadtGermany

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