Abstract
For the analysis of dopant elements in semiconductors an intense primary ion beam, high transmission efficiency for the secondary ion mass spectrometer and sensitive detection of secondary ions are essential. We found that the performance of our IMMA (manufacturer Applied Research Laboratories) could be improved in these areas.
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W. Bedrich, B. Koch, H. Mai, U. Seidenkranz, H. Syhre and R. Voigtmann, SIMS III (Proc. Int. Conf., Eds. A. Benninghoven et al) Springer Verlag Berlin 1979, p. 81
B.L. Bentz and H. Liebl, ibid, p. 30
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© 1986 Springer-Verlag Berlin Heidelberg
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Miethe, K., Pöcker, A. (1986). Improvement of an Ion Microprobe Mass Analyzer (IMMA). In: Benninghoven, A., Colton, R.J., Simons, D.S., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS V. Springer Series in Chemical Physics, vol 44. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82724-2_40
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DOI: https://doi.org/10.1007/978-3-642-82724-2_40
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-82726-6
Online ISBN: 978-3-642-82724-2
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