Abstract
The electronic and crystallographic structure of semiconductor surfaces and interfaces is important not only fundamentally but also practically for the emerging range of low-dimensionality device structures [1]. The growth technique of molecular beam epitaxy (MBE) based on ultra high vacuum has been used successfully in both areas and it has been demonstrated that film properties can be related to surface conditions during growth [2] .
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Larsen, P.K., Joyce, B.A., Dobson, P.J. (1985). RHEED and Photoemission Studies of Semiconductors Grown in-situ by MBE. In: Nizzoli, F., Rieder, KH., Willis, R.F. (eds) Dynamical Phenomena at Surfaces, Interfaces and Superlattices. Springer Series in Surface Sciences, vol 3. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82535-4_21
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DOI: https://doi.org/10.1007/978-3-642-82535-4_21
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