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Laser Assisted Pyrolytic Growth and Photochemical Deposition of Thin Oxide Films

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Book cover Laser Processing and Diagnostics

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 39))

Abstract

Lasers offer a diverse approach to fabricating oxide films for a wide variety of applications. This paper will review the field of laser oxidation in general but particular attention will be focused on oxide formation on silicon. Two main areas will be detailed, namely Laser Chemical Vapor Deposition (LCVD) and Laser Pyrolytic Growth (LPG). The kinetics involved with film preparation will be discussed while the various structural, optical and electrical properties of the films will be compared.

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Authors and Affiliations

  1. Center for Applied Quantum Electronics, Department of Physics, North Texas State University, Denton, TX, 76203, USA

    Ian W. Boyd

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  1. Ian W. Boyd
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Editors and Affiliations

  1. Institut für Angewandte Physik, Johannes-Kepler-Universität, A-4040, Linz, Austria

    Dieter Bäuerle

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© 1984 Springer-Verlag Berlin Heidelberg

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Boyd, I.W. (1984). Laser Assisted Pyrolytic Growth and Photochemical Deposition of Thin Oxide Films. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_37

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  • DOI: https://doi.org/10.1007/978-3-642-82381-7_37

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82383-1

  • Online ISBN: 978-3-642-82381-7

  • eBook Packages: Springer Book Archive

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