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Applications of Excimer Lasers to Semiconductor Processing

  • Conference paper
Laser Processing and Diagnostics

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 39))

Abstract

The basic processes involved in making an integrated circuit are the production of patterns by photolithography, the deposition of thin films of insulators and conductors, doping of semiconductors, and patterning of material by etching. Excimer lasers are being used to perform each of these operations in the laboratory and, in some cases, are being considered for use in a production environment. This paper will review the developments in each of these areas. Two conference proceedings contain a number of articles dealing with excimer laser processing [1,2].

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Author information

Author notes

  1. T. F. Deutsch

    Present address: Department of Dermatology, Massachusetts General Hospital, Boston, Massachusetts, 02114, USA

Authors and Affiliations

  1. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA, 02173-0073, USA

    T. F. Deutsch

Authors
  1. T. F. Deutsch
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Editor information

Editors and Affiliations

  1. Institut für Angewandte Physik, Johannes-Kepler-Universität, A-4040, Linz, Austria

    Dieter Bäuerle

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© 1984 Springer-Verlag Berlin Heidelberg

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Deutsch, T.F. (1984). Applications of Excimer Lasers to Semiconductor Processing. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_32

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  • DOI: https://doi.org/10.1007/978-3-642-82381-7_32

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82383-1

  • Online ISBN: 978-3-642-82381-7

  • eBook Packages: Springer Book Archive

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