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The Physics of Ultraviolet Photodeposition

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Laser Processing and Diagnostics

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 39))

Abstract

Ultraviolet photodeposition is a technique for direct laser writing of submicrometer metal patterns on solid substrates. The process involves a wealth of unexplored physical phenomena including micrometer-scale ultraviolet photochemistry and surface and interface chemical dynamics. This paper briefly reviews the current developments in understanding the process physics. In addition, the applications of the technique to microelectronics fabrication are briefly discussed.

This work was supported by the Defense Advanced Research Projects Agency and the Air Force Office of Scientific Research, the Department of Army (ARO), and the Joint Services Electronics Program.

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Author information

Authors and Affiliations

  1. Columbia Microelectronics Sciences Laboratories, Columbia University, New York, NY, 10027, USA

    H. H. Gilgen, C. J. Chen, R. Krchnavek & R. M. Osgood Jr.

Authors
  1. H. H. Gilgen
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  2. C. J. Chen
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  3. R. Krchnavek
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  4. R. M. Osgood Jr.
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Editor information

Editors and Affiliations

  1. Institut für Angewandte Physik, Johannes-Kepler-Universität, A-4040, Linz, Austria

    Dieter Bäuerle

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© 1984 Springer-Verlag Berlin Heidelberg

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Gilgen, H.H., Chen, C.J., Krchnavek, R., Osgood, R.M. (1984). The Physics of Ultraviolet Photodeposition. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_30

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  • DOI: https://doi.org/10.1007/978-3-642-82381-7_30

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82383-1

  • Online ISBN: 978-3-642-82381-7

  • eBook Packages: Springer Book Archive

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