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Laser Processing in Silicon on Insulator (SOI) Technologies

  • Conference paper
Laser Processing and Diagnostics

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 39))

Abstract

Silicon on insulator (SOI) technologies are an attractive alternative for VLSI circuit manufacturing, owing to such advantages as reduced parasitic capacitances, latch-up immunity and insensitivity to alpha particles. SOI technologies may be also viewed as a first but necessary step towards 3-D integration.

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Author information

Authors and Affiliations

  1. Centre National d’Etudes des Télécommunications, BP. 98, Meylan Cédex, France

    V. T. Nguyen

Authors
  1. V. T. Nguyen
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SOI Group

Editor information

Editors and Affiliations

  1. Institut für Angewandte Physik, Johannes-Kepler-Universität, A-4040, Linz, Austria

    Dieter Bäuerle

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© 1984 Springer-Verlag Berlin Heidelberg

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Nguyen, V.T., SOI Group. (1984). Laser Processing in Silicon on Insulator (SOI) Technologies. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_12

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  • DOI: https://doi.org/10.1007/978-3-642-82381-7_12

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82383-1

  • Online ISBN: 978-3-642-82381-7

  • eBook Packages: Springer Book Archive

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