Abstract
For the studies of the surface properties of solids and the measurement of the depth profile of an element, ion beam sputtering has been used generally in combination with various methods for surface analysis, e.g. secondary ion mass spectrometry(SIMS). However, it has not been investigated experimentally about the interrelations of the sputtering and the changes of surface states.[1]
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References
T. Itoh and K. Hara: Proc. Int. Ion Engineering Congr. -ISIAT’83 & IPAT’83- Kyoto, (1983) pp. 1969–1974
P.A. Bertrand: J. Vac. Sci. Techn. , 18, 28 (1981)
David R. Penn: J. Vac. Sci. Techn., 13, 221 (1976)
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© 1984 Springer-Verlag Berlin Heidelberg
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Hara, K., Itoh, T. (1984). The Effects of Ion Beam Sputtering on the Chemical State of Metal Oxide Surfaces. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_67
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DOI: https://doi.org/10.1007/978-3-642-82256-8_67
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