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Quantitative Investigation of As Segregation at the SiO2/Si Interface by SIMS and RBS

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Secondary Ion Mass Spectrometry SIMS IV

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 36))

Abstract

Dynamic segregation of dopants at the SiO2/Si-interface during thermal oxidation is of major interest for process development and modelling in silicon integration circuit technology. The dopant concentrations of interest extend over a wide concentration range, hardly accessible with methods other than SIMS.

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References

  1. W. Reuter and K. Wittmaack: Appl. Surf. Sci. 5, 221 (1980)

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  2. J. Maul, H. Frenzel: Proceedings, Springer Series in Electrophysics 10, 361 (1982)

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  3. H. Frenzel: Ph. D. Thesis, Technical University Aachen, FRG (1980)

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  4. K. Wittmaack: Appl. Phys. Lett. 29, 552 (1970)

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Author information

Authors and Affiliations

  1. Atomika Technische Physik GmbH, München, D-8000, Fed. Rep. of Germany

    H. Frenzel & J. L. Maul

  2. Institut für Festkörpertechnologie, München, D-8000, Fed. Rep. of Germany

    P. Eichinger, E. Frenzel, K. Haberger & H. Ryssel

Authors
  1. H. Frenzel
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  2. J. L. Maul
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  3. P. Eichinger
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  4. E. Frenzel
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  5. K. Haberger
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  6. H. Ryssel
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Editor information

Editors and Affiliations

  1. Phsysikalisches Inst., Universität Münster, Münster, D-4400, Fed. Rep. of Germany

    A. Benninghoven

  2. College of General Education, Osaka University, Osaka 560, Japan

    J. Okano

  3. Department of Applied Physics, Osaka University, Osaka 565, Japan

    R. Shimizu

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1984 Springer-Verlag Berlin Heidelberg

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Frenzel, H., Maul, J.L., Eichinger, P., Frenzel, E., Haberger, K., Ryssel, H. (1984). Quantitative Investigation of As Segregation at the SiO2/Si Interface by SIMS and RBS. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_65

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  • DOI: https://doi.org/10.1007/978-3-642-82256-8_65

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82258-2

  • Online ISBN: 978-3-642-82256-8

  • eBook Packages: Springer Book Archive

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