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Secondary Ion Mass Spectrometry SIMS IV pp 114–118Cite as

Ion Gun Systems for Submicron SIMS

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Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 36))

Abstract

The possibility of submicron scanning ion microscopy was demonstrated long ago [1, 2], Its potential use for SIMS applications has been the subject of theoretical and experimental investigations in a number of laboratories [3–12]. With the growing importance of submicron devices this instrumentation will surely have a future.

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References

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Author information

Authors and Affiliations

  1. Max-Planck-Institut für Plasmaphysik, EURATOM-Association, Garching, D-8046, Fed. Rep. of Germany

    H. Liebl

Authors
  1. H. Liebl
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Editor information

Editors and Affiliations

  1. Phsysikalisches Inst., Universität Münster, Münster, D-4400, Fed. Rep. of Germany

    A. Benninghoven

  2. College of General Education, Osaka University, Osaka 560, Japan

    J. Okano

  3. Department of Applied Physics, Osaka University, Osaka 565, Japan

    R. Shimizu

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1984 Springer-Verlag Berlin Heidelberg

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Liebl, H. (1984). Ion Gun Systems for Submicron SIMS. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_33

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  • DOI: https://doi.org/10.1007/978-3-642-82256-8_33

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82258-2

  • Online ISBN: 978-3-642-82256-8

  • eBook Packages: Springer Book Archive

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