Abstract
Recently, the surface analysis of polymer materials has been becoming more and more important in industry. SIMS is expected to become a powerful tool for characterization of polymer surfaces. Several authors [1–5] have discussed the potential of SIMS in the field. However, understanding of sputtering mechanism of polymers is far from a satisfactory level. In this paper, we have examined sputtered surfaces with XPX and interpreted the observed spectra with a simple calculation based on Monte Carlo simulation.
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References
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© 1984 Springer-Verlag Berlin Heidelberg
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Takahagi, T., Okuno, K., Tomita, S., Ishitani, A. (1984). Monte Carlo Simulation of an Ion Sputtering Process of Polymer Materials. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_100
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DOI: https://doi.org/10.1007/978-3-642-82256-8_100
Publisher Name: Springer, Berlin, Heidelberg
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