Introduction

Abstract

Modern technologies frequently make use of the interaction of gases and fluids with solids and the properties of interfaces or thin films. Still our knowledge about fundamental processes at surfaces and interfaces is rather limited. The great difficulties in the understanding of heterogeneous catalysis, corrosion protection, semiconductor and thin-film technology have spurred many scientists to develop new tools for the study of surfaces and to learn more about the chemical and physical nature of the solid in its outermost atomic layers. Concurrently, the commercial availability of surface analysis instruments and the mature stage of ultrahigh-vacuum equipment in general is already beginning to have a major impact on further progress of the applied sciences.