Energy Levels of Defects in Ion Implanted Silicon

  • D. Eirug Davies
  • S. Roosild
Conference paper


Thermal stimulated currents and the temperature dependence of dark leakage currents in ion irradiated diffused junctions have been used to establish defect energy levels in low dose ion implanted silicon. Such implants lead to the creation of at least seven different levels whose depth range from .25 eV to close to midgap. Defect annealing occurs in several different stages while some of the defects initially exhibit a pronounced increase in concentration on heat treatment above room temperature.


Space Charge Region Minority Carrier Lifetime Annealing Behavior Thermally Stimulate Current Annealing Stage 
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  1. 1.
    Mayer, J.W., Erikson, L., Davies, J.A.: Ion Implantation in Semiconductors, Academic Press, N.Y. (1970).Google Scholar
  2. 2.
    Bube, R. H.: Photoconductivity of Solids, Wiley, N.Y. (1960).Google Scholar
  3. 3.
    Wysocki, J.J.: J. Appl. Phys. 36, 2968 (1965).CrossRefGoogle Scholar
  4. 4.
    Weisburg, L.R., Schade, H.: J. Appl. Phys. 39, 5149 (1968).CrossRefGoogle Scholar
  5. 5.
    Schade, H., Herrik, D.: Solid State Electron 12, 857 (1969).CrossRefGoogle Scholar
  6. 6.
    See, for example, Grove, A.S.: Physics and Technology of Semiconductor Devices, Wiley, N.Y. (1967) p. 174.Google Scholar
  7. 7.
    Stein, H.J., Vook, F.L., Borders, J.A.: Appl. Phys. Lett. 14, 328 (1969).CrossRefGoogle Scholar
  8. 8.
    Davies, D.E., Roosild, S.: Solid State Electron, to be published, Appl. Phys. Lett. 17, 107 (1970).CrossRefGoogle Scholar
  9. 9.
    Pickar, K.A., Dalton, J.V.: Proc. First Int. Conf. on Ion Implantation in Semiconductors, Thousand Oaks (1970).Google Scholar
  10. 10.
    Davies, D.E., Roosild, S.: Appl. Phys. Lett., June 1971.Google Scholar

Copyright information

© Springer-Verlag, Berlin · Heidelberg 1971

Authors and Affiliations

  • D. Eirug Davies
    • 1
  • S. Roosild
    • 1
  1. 1.Air Force Cambridge Research LaboratoriesAir Force Systems CommandBedfordUSA

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