Abstract
The annealing behavior of variable dose implants of BF2 molecules has been studied in comparison to boron implants. In the case of a 1015 cm-2 room temperature BF2 implantation the annealing data indicate that an amorphous layer was formed; the sheet resistivity after 650°C anneal is a factor of 10 lower than for an equivalent energy boron implant and the samples are nearly completely annealed. For doses of ⩽1014 cm-2 there is no marked difference in the annealing of BF2 and boron implants. These results were compared to the annealing of predamaged samples and cold implants which show lower electrical activity. Studies of range distributions and electrical profiles were performed by He-backscattering and successive layer removal techniques and show close agreement with theoretical considerations. From the electrical point of view there is no evident influence of the fluorine component of the molecule. C-V measurements were taken to determine the BF2 behavior in SiO2. It is shown that surface states are annealed out at 400°C.
Keywords
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Sansbury, J.D., Gibbons, J.F.: Appl. Phys. Lett. 14, 311 (1969).
Johnson, W.S., Gibbons, J.F.: Projected Range Statistics in Semiconductors, Stanford (1969).
Wahlin, L.: Nucl. Instr. Meth. 27, 55 (1964).
Van der Pauw, L.J.: Philips Res. Repts. 13, 1 (1958).
Duffek, E.F., Mylroie, C., Benjamini, E.A.: J. Electrochem. Soc. 9, 1042 (1964).
Crowder, B.L., Fairfield, J.M.: J. Electrochem. Soc. 117, 363 (1970).
Mayer, J.W., Eriksson, L., Davies, J.A.: Ion Implantation in Semiconductors, Academic Press (1970).
Isoya, A., Goto, K., Momota, T.: J. Phys. Soc. Jap. 11, 899 (1956).
Davies, D.E.: Appl. Phys. Lett. 14, 227 (1969).
Baron, R., Shiffrin, G.A., Marsh, O.J., Mayer, J.W.: J. Appl. Phys. 40, 3702 (1969).
Clark, A.H., Manchester, K.E.: Trans. Met. Soc. AIME 242, 1173 (1968).
Blamires, N.G.: European Conference on Ion Implantation, Reading, Peter Peregrinus Ltd. (1970).
Fladda, G., Bjorkqvist, K., Eriksson, L., Sigurd, D.: Appl. Phys. Lett. 16, 313 (1970).
Blamires, N.G. et al.: Phys. Lett. 28A, 178 (1968).
Hart, R.R., Marsh, O.J.: private communication.
Morin, F.J., Maita, J.P.: Phys. Rev. 96, 28 (1954).
Patrick, W.J.: Solid State Electronics 9, 203 (1966).
Goetzberger, A.: private communication.
Author information
Authors and Affiliations
Editor information
Rights and permissions
Copyright information
© 1971 Springer-Verlag, Berlin · Heidelberg
About this paper
Cite this paper
Müller, H., Ryssel, H., Ruge, I. (1971). A New Method for Boron Doping of Silicon by Implantation of BF2-Molecules. In: Ruge, I., Graul, J. (eds) Ion Implantation in Semiconductors. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-80660-5_13
Download citation
DOI: https://doi.org/10.1007/978-3-642-80660-5_13
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-80662-9
Online ISBN: 978-3-642-80660-5
eBook Packages: Springer Book Archive