Advertisement

Ultrafast Surface Reaction and Desorption Probed by Femtosecond Second Harmonic Generation: Cl Etching of Si(111) Surface

  • F. Sasaki
  • S. Haraichi
  • S. Kobayashi
  • T. Tani
  • M. Komuro
Conference paper
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 62)

Abstract

In order to establish a new maicrofabrication of semiconductors, we need to clarify the mechanisms of reaction between material surfaces and reactive species. Especially, the dry etching process on Si surface is the most spreading process in the electronics applications and has been extensively studied [1]. The optical second harmonic generation is also a powerful technique to study surface science because of its surface sensitivity, non-detrimental and in-situ observation, and the ultrafast response [2]. Femtosecond time-resolved studies of the desorption and/or reaction on the metal or semiconductor surfaces have been carried out [3,4]. In this letter we report the results of the laser-induced surface reaction and/or desorption on the Si(111)/Cl2 system by using the femtosecond second harmonic generation.

Keywords

Harmonic Generation Pump Pulse Probe Pulse Sample Chamber Probe Wavelength 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Reference

  1. (1).
    H. F. Winters and J. W. Coburn, Surf. Sci. Rep. 14, 161 (1992).CrossRefADSGoogle Scholar
  2. (2).
    for recent reviews, Y. R. Shen, Nature 337, 519 (1989)CrossRefADSGoogle Scholar
  3. (2).
    J. Bokor, Science 246, 1130 (1989).CrossRefADSGoogle Scholar
  4. (3).
    F. Budde et al. Phys. Rev. Lett. 66, 3024 (1991).CrossRefADSGoogle Scholar
  5. (4).
    J. A. Prybyla et al. Phys. Rev. Lett. 68, 503 (1992).CrossRefADSGoogle Scholar
  6. (5).
    S. Haraichi et al. J. Vac. Sci. Tech. A 13, 745 (1995).CrossRefADSGoogle Scholar
  7. (6).
    H. W. K. Tom et al. Phys. Rev. Lett. 52, 348 (1984).CrossRefADSGoogle Scholar
  8. (7).
    T. N. Rhodin et al. Surf. Sci. 283, 109 (1993).CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1996

Authors and Affiliations

  • F. Sasaki
    • 1
  • S. Haraichi
    • 1
  • S. Kobayashi
    • 1
  • T. Tani
    • 1
  • M. Komuro
    • 1
  1. 1.Electrotechnical LaboratoryTsukuba, Ibaraki 305Japan

Personalised recommendations