Abstract
Recent progress in the atomic-scale modeling of epitaxial growth and chemical-beam etching of GaAs(001) using kinetic Monte Carlo simulations of a simple solid-on-solid model is reviewed. The additional activation barrier to interlayer transport emerges as a key factor for the evolution of the surface morphology during both growth and etching.
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Šmilauer, P., Vvedensky, D.D. (1995). Growth and Etching of GaAs(001). In: Landau, D.P., Mon, K.K., Schüttler, HB. (eds) Computer Simulation Studies in Condensed-Matter Physics VIII. Springer Proceedings in Physics, vol 80. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-79991-4_4
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DOI: https://doi.org/10.1007/978-3-642-79991-4_4
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