Fabrication of Quantum-Wire Structures by Atomic-Layer Epitaxy and VPE Processes
Growth-oriented process for fabricating quantum wire structure is presented, which can avoid complicated nano-scale lithography process and reduce process-induced defects. Chloride ALE, hydride VPE and in-situ selective gas etching are used here as main tools. The fabrication of T-shaped quantum wire structures is demonstrated.
KeywordsAtomic Layer Epitaxy XTEM Image Horizontal White Line Thin GaAs Layer Etched Sidewall
Unable to display preview. Download preview PDF.